公开(公告)号：US20240417855A1

公开(公告)日：2024-12-19

申请号：US18739563

申请日：2024-06-11

Applicant: ASM IP Holding B.V.

Inventor： Ippei Yanagisawa ,  Takashi Hamaguchi

IPC: C23C16/458

Abstract: A substrate supporting apparatus includes: a susceptor configured for a substrate to be place on; and a moving mechanism that is connected to the susceptor and configured to rotate the susceptor about a central axis of the susceptor, the central axis extending in a vertical direction, wherein the moving mechanism is configured to move the susceptor further in a direction extending in an imaginary horizontal plane perpendicular to the central axis.

公开(公告)号：US20210102289A1

公开(公告)日：2021-04-08

申请号：US17039874

申请日：2020-09-30

Applicant: ASM IP Holding B.V.

Inventor： Naoto Tsuji ,  Ippei Yanagisawa ,  Miho Shimotori ,  Makoto Igarashi

IPC: C23C16/458 ,  C23C16/455 ,  C23C16/505 ,  H01J37/32

Abstract: Examples of a substrate processing device include an annular distribution ring, a plurality of connection plates continued to the distribution ring and having non-uniform impedances, a shower plate electrically connected to the plurality of connection plates, and a stage provided below the shower plate so as to face the shower plate.

公开(公告)号：US20230207308A1

公开(公告)日：2023-06-29

申请号：US18088041

申请日：2022-12-23

Applicant: ASM IP Holding B.V.

Inventor： Chie Kaneko ,  Ippei Yanagisawa ,  Yu Min Huang

IPC: H01L21/02

CPC classification number: H01L21/02216 ,  H01L21/02211 ,  H01L21/02274 ,  H01J37/32091

Abstract: Methods and systems for forming a low-k material layer on a surface of a substrate and structures and devices formed using the method or system are disclosed. Exemplary methods include providing a substrate within a reaction chamber of a reactor system, providing one or more precursors to the reaction chamber, and providing high frequency, high plasma power to polymerize the one or more precursors to form dense low-k material with desired properties.

公开(公告)号：US20230069139A1

公开(公告)日：2023-03-02

申请号：US17896218

申请日：2022-08-26

Applicant: ASM IP Holding B.V.

Inventor： Ippei Yanagisawa ,  Chiao Yin Nien

IPC: C23C16/44 ,  C23C16/513

Abstract: A CVD apparatus includes a chamber, a susceptor, an entry/takeout port for a substrate, and a gate valve provided at the entry/takeout port, in which the susceptor has a mounting plate and a support, the entry/takeout port is provided on a part of a side of the chamber, and is provided in a range from an inner bottom surface of the chamber to a position corresponding to the lower surface of the mounting plate when the susceptor is located at an upper end in the vertical direction, and the inner bottom surface of the chamber, the range from the inner bottom surface of the chamber to the position corresponding to the lower surface of the mounting plate when the susceptor is located at the upper end in the vertical direction, the lower surface of the mounting plate, and the outer side surface of the support are coated with ceramic liners.

公开(公告)号：US11359302B2

公开(公告)日：2022-06-14

申请号：US17126275

申请日：2020-12-18

Applicant: ASM IP Holding B.V.

Inventor： Ippei Yanagisawa

IPC: C25D11/24 ,  C25D11/16 ,  H05B6/10 ,  C25D17/16 ,  C25D21/12

Abstract: Examples of a susceptor for supporting a substrate includes a base metal formed of aluminum or a material containing aluminum, an anodized layer covering a surface of the base metal and having cracks therein, and a CF coating of polymer provided in the cracks such that the exposure of the base metal is avoided.

公开(公告)号：US11339476B2

公开(公告)日：2022-05-24

申请号：US17039874

申请日：2020-09-30

Applicant: ASM IP Holding B.V.

Inventor： Naoto Tsuji ,  Ippei Yanagisawa ,  Miho Shimotori ,  Makoto Igarashi

IPC: H01J37/32 ,  C23C16/458 ,  C23C16/505 ,  C23C16/455 ,  C23C16/54

Abstract: Examples of a substrate processing device include an annular distribution ring, a plurality of connection plates continued to the distribution ring and having non-uniform impedances, a shower plate electrically connected to the plurality of connection plates, and a stage provided below the shower plate so as to face the shower plate.