公开(公告)号：US09740112B2

公开(公告)日：2017-08-22

申请号：US14436070

申请日：2013-09-23

Applicant: ASML Holding N.V. ,  ASML Netherlands B.V.

Inventor： Arindam Sinharoy ,  Stephen S. Roux ,  Jean-Philippe Xavier Van Damme ,  Daniel Nathan Burbank ,  Mark Josef Schuster ,  Duncan Harris ,  Christopher Charles Ward

IPC: G03F7/20

CPC classification number: G03F7/70733 ,  G03F7/707 ,  G03F7/70783

Abstract: A patterning device support (200), for example, a patterning device (202) or substrate support, can be configured to release internal stresses of a patterning device loaded thereon. The patterning device support can include a positive pressuring generating interface (206a, 206b) or an acoustic vibration generating interface (206a, 206b), or can be configured to oscillate while at least a portion of patterning device is decoupled from the patterning device support. A method of transferring a patterning device between a patterning device handling apparatus and a patterning device support configured to move the patterning device can include positioning the patterning device onto a surface of the patterning device support, and performing a process that releases internal stress of the patterning device.

公开(公告)号：US20150277240A1

公开(公告)日：2015-10-01

申请号：US14436070

申请日：2013-09-23

Applicant: ASML HOLDING N.V. ,  ASML NETHERLANDS B.V.

Inventor： Arindam Sinharoy ,  Stephen S. Roux ,  Jean-Philippe Xavier Van Damme ,  Daniel Nathan Burbank ,  Mark Josef Schuster ,  Duncan Harris ,  Christopher Charles Ward

IPC: G03F7/20

CPC classification number: G03F7/70733 ,  G03F7/707 ,  G03F7/70783

Abstract: A patterning device support (200), for example, a patterning device (202) or substrate support, can be configured to release internal stresses of a patterning device loaded thereon. The patterning device support can include a positive pressuring generating interface (206a, 206b) or an acoustic vibration generating interface (206a, 206b), or can be configured to oscillate while at least a portion of patterning device is decoupled from the patterning device support. A method of transferring a patterning device between a patterning device handling apparatus and a patterning device support configured to move the patterning device can include positioning the patterning device onto a surface of the patterning device support, and performing a process that releases internal stress of the patterning device.

Abstract translation: 图案形成装置支撑件（200），例如，图案形成装置（202）或基板支撑件可以构造成释放装载在其上的图案形成装置的内部应力。 图案形成装置支撑件可以包括正压力生成界面（206a，206b）或声振动产生界面（206a，206b），或者可以被配置为在图案形成装置的至少一部分与图案形成装置支撑件分离的同时进行摆动。 在图案形成装置处理装置和被构造成移动图案形成装置的图案形成装置支撑件之间传送图案形成装置的方法可以包括将图案形成装置定位在图案形成装置支撑件的表面上，并且执行释放图案形成装置的内部应力 设备。