公开(公告)号：US20240319585A1

公开(公告)日：2024-09-26

申请号：US18579565

申请日：2022-07-19

Applicant: KONINKLIJKE PHILIPS N. V.

Inventor： Marcus Antonius Verschuuren ,  Didier Mathijs Maria Petit ,  Merijn wijnen ,  Maurice Leonardus Johnnes Janssen

IPC: G03F7/00

CPC classification number: G03F7/0002 ,  G03F7/707 ,  G03F7/70733 ,  G03F7/70775

Abstract: An imprinting apparatus comprises a first carrier for carrying a flexible stamp and a second carrier movable relative to the first carrier and configured to carry a substrate having a resist layer. The second carrier comprises a chuck, a set of chuck actuators for translating a portion of the chuck in a Z-axis direction, a stamp landing device (e.g., ring) around an outside of the chuck and a set of landing ring actuators for translating a portion of the stamp landing ring in a Z-axis direction. Movement of the stamp landing ring in addition to movement of the chuck enables the apparatus to take account of different stamp thicknesses.

公开(公告)号：US12033880B2

公开(公告)日：2024-07-09

申请号：US16952092

申请日：2020-11-19

Applicant: Sumitomo Electric Industries, Ltd.

Inventor： Koichi Kimura ,  Shigenobu Sakita ,  Kenji Shinma ,  Daisuke Shimao ,  Katsuhiro Itakura ,  Masuhiro Natsuhara ,  Akira Mikumo

IPC: H01L21/683 ,  C23C14/50 ,  C23C14/54 ,  C23C16/458 ,  C23C16/46 ,  C23C16/509 ,  H01L21/3065 ,  H01L21/31 ,  H01L21/67 ,  G03F7/00

CPC classification number: H01L21/6831 ,  C23C14/50 ,  C23C14/541 ,  C23C16/458 ,  C23C16/4581 ,  C23C16/4586 ,  C23C16/46 ,  C23C16/509 ,  H01L21/3065 ,  H01L21/31 ,  H01L21/67103 ,  G03F7/707

Abstract: A wafer holding unit includes a disk-shaped ceramic substrate having a wafer mounting surface on an upper surface of the substrate, an RF electrode, for example, embedded within the substrate, a metal terminal inserted from a lower surface of the substrate, and a connecting terminal which electrically connects the RF electrode and the metal terminal with each other. The connecting terminal is constituted by a ceramic member and a metal layer. The ceramic member is made of the same material as the substrate and preferably has a truncated conical shape. The metal layer covers a surface of the ceramic member. An upper end of the metal layer is connected to the RF electrode, while a lower end of the metal layer is connected to the metal terminal with a metal member interposed therebetween.

公开(公告)号：US11984341B2

公开(公告)日：2024-05-14

申请号：US16610161

申请日：2018-05-08

Applicant: MITSUI CHEMICALS TOHCELLO, INC.

Inventor： Eiji Hayashishita

IPC: H01L21/683 ,  C09J7/20 ,  G03F7/00 ,  H01L21/60

CPC classification number: H01L21/683 ,  C09J7/20 ,  G03F7/707 ,  H01L2021/6015

Abstract: A component-manufacturing tool includes a frame body and a holding film covering an opening, wherein the frame body includes a first frame and a second frame; the holding film includes a base layer and a holding layer provided on one surface of the base layer, and the holding film is sandwiched and held between the first frame and the second frame in a stretched state; and a ratio RE1 (=E′(100)/E′(25)) of an elastic modulus E′(100° C.) of the base layer to an elastic modulus E′(25° C.) of the base layer is 0.2≤RE1≤1, and E′(25) is 35 MPa or more and 3500 MPa or less. A component-manufacturing method includes a component holding step of holding components to the holding layer of the component-manufacturing tool; and a chucking step of chucking and fixing the holding film, to which holds the components, to a surface of a heated chuck table.

公开(公告)号：US20240027915A1

公开(公告)日：2024-01-25

申请号：US18453594

申请日：2023-08-22

Applicant: ASML NETHERLANDS B.V.

Inventor： Raymond Wilhelmus Louis LAFARRE ,  Sjoerd Nicolaas Lambertus Donders ,  Nicolaas TEN KATE ,  Nina Vladimirovna DZIOMKINA ,  Yogesh Pramod KARADE ,  Elisabeth Corinne RODENBURG

IPC: G03F7/00 ,  B23K26/354 ,  B23K26/342 ,  B22F10/00 ,  B22F10/20 ,  B23Q3/18 ,  G03F7/20 ,  B05D3/06 ,  B05D5/00 ,  B33Y10/00 ,  B33Y80/00 ,  B22F7/06

CPC classification number: G03F7/70341 ,  B23K26/354 ,  B23K26/342 ,  G03F7/70416 ,  G03F7/707 ,  G03F7/70708 ,  B22F10/00 ,  B22F10/20 ,  B23Q3/18 ,  G03F7/20 ,  G03F7/70716 ,  B05D3/06 ,  B05D5/00 ,  G03F7/70733 ,  B33Y10/00 ,  B33Y80/00 ,  B22F7/062 ,  G03F7/708 ,  B22F10/25

Abstract: An object holder for a lithographic apparatus has a main body having a surface. A plurality of burls to support an object are formed on the surface or in apertures of a thin-film stack. At least one of the burls is formed by laser-sintering. At least one of the burls formed by laser-sintering may be a repair of a damaged burl previously formed by laser-sintering or another method.

公开(公告)号：US11835872B2

公开(公告)日：2023-12-05

申请号：US17881948

申请日：2022-08-05

Applicant: CANON KABUSHIKI KAISHA

Inventor： Toru Kobori

IPC: G03F9/00 ,  G03F7/00 ,  G03F7/20

CPC classification number: G03F9/7042 ,  G03F7/0002 ,  G03F7/707

Abstract: A positioning apparatus includes a guide, a movable member capable of moving in a first direction while being guided by the guide, and a driver configured to drive the movable member in the first direction. The driver includes a feed screw extending in the first direction, a nut configured to threadably engage with the feed screw and move in the first direction along with a rotation of the feed screw, and a connecting device configured to connect the nut and the movable member. The connecting device includes a hollow rod with one end connected to the movable member and the other end connected to the nut, and the feed screw is inserted into a hollow portion of the rod.

公开(公告)号：USRE49732E1

公开(公告)日：2023-11-21

申请号：US16427228

申请日：2019-05-30

Applicant: ASML Netherlands B.V.

Inventor： Paul IJmert Scheffers ,  Jan Andries Meijer ,  Erwin Slot ,  Vincent Sylvester Kuiper ,  Niels Vergeer

IPC: H01J37/09 ,  H01J37/16 ,  H01J37/304 ,  B82Y40/00 ,  G03F7/00 ,  B82Y10/00

CPC classification number: H01J37/3045 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/707 ,  H01J2237/1502

Abstract: A multi-beamlet charged particle beamlet lithography system for transferring a pattern to a surface of a substrate. The system comprises a projection system (311) for projecting a plurality of charged particle beamlets (7) onto the surface of the substrate; a chuck (313) moveable with respect to the projection system; a beamlet measurement sensor (i.a. i.e., 505, 511) for determining one or more characteristics of one or more of the charged particle beamlets, the beamlet measurement sensor having a surface (501) for receiving one or more of the charged particle beamlets; and a position mark measurement system for measuring a position of a position mark (610, 620, 635), the position mark measurement system comprising an alignment sensor (361, 362). The chuck comprises a substrate support portion for supporting the substrate, a beamlet measurement sensor portion (460) for accommodating the surface of the beamlet measurement sensor, and a position mark portion (470) for accommodating the position mark.

公开(公告)号：US11769683B2

公开(公告)日：2023-09-26

申请号：US17728820

申请日：2022-04-25

Applicant: Applied Materials, Inc.

Inventor： Wendell Glenn Boyd, Jr. ,  Vijay D. Parkhe ,  Teng-Fang Kuo ,  Zhenwen Ding

IPC: H01L21/683 ,  H01L21/687 ,  C03C17/00 ,  G03F7/00 ,  H02N13/00

CPC classification number: H01L21/6833 ,  C03C17/00 ,  H01L21/6875 ,  H01L21/68757 ,  G03F7/707 ,  H01L21/683 ,  H01L21/6831 ,  H02N13/00

Abstract: A coated chamber component comprises a body and a protective ceramic coating deposited over a surface of the body, the protective ceramic coating being amorphous and comprising about 8-20% by weight yttrium, about 20-32% by weight aluminum, and about 60-70% by weight oxygen.

公开(公告)号：US20230260820A1

公开(公告)日：2023-08-17

申请号：US18305925

申请日：2023-04-24

Applicant: ASML NETHERLANDS B.V.

Inventor： Andre Bernardus JEUNINK ,  Robby Franciscus Josephus MARTENS ,  Youssef Karel Maria DE VOS ,  Ringo Petrus Cornelis VAN DORST ,  Gerhard Albert TEN BRINKE ,  Dirk Jerome Andre SENDEN ,  Coen Hubertus Matheus BALTIS ,  Justin Johannes Hermanus GERRITZEN ,  Jelmer Mattheüs KAMMINGA ,  Evelyn Wallis PACITTI ,  Thomas POIESZ ,  Arie Cornelis SCHEIBERLICH ,  Bert Dirk SCHOLTEN ,  André SCHREUDER ,  Abraham Alexander SOETHOUDT ,  Siegfried Alexander TROMP ,  Yuri Johannes Gabriël VAN DE VIJVER

IPC: H01L21/683 ,  G03F7/00 ,  H01L21/687 ,  B25B11/00

CPC classification number: H01L21/6838 ,  G03F7/707 ,  G03F7/70733 ,  H01L21/68742 ,  B25B11/005

Abstract: A method for unloading a substrate from a support table configured to support the substrate, the method including: supplying gas to a gap between a base surface of the support table and the substrate via a plurality of gas flow openings in the support table, wherein during an initial phase of unloading the gas is supplied through at least one gas flow opening in an outer region of the support table and not through any gas flow opening in a central region of the support table radially inward of the outer region, and during a subsequent phase of unloading the gas is supplied through at least one gas flow opening in the outer region and at least one gas flow opening in the central region.

公开(公告)号：US20230176492A1

公开(公告)日：2023-06-08

申请号：US18161140

申请日：2023-01-30

Applicant: Carl Zeiss SMT GmbH ,  ASML NETHERLANDS B.V.

Inventor： Toralf GRUNER ,  Norman BAER ,  Koos VAN BERKEL ,  Laurentius Johannes Adrianus VAN BOKHOVEN ,  Maike LORENZ ,  Thomas MONZ ,  Eva SCHNEIDER ,  Hans-Michael STIEPAN ,  Bob STREEFKERK ,  André DIRAUF

IPC: G03F7/20 ,  G02B7/18

CPC classification number: G03F7/70891 ,  G02B7/1815 ,  G02B2207/101 ,  G03F7/707

Abstract: Disclosed are an optical system, in particular for microlithography, and a method for operating an optical system. According to one disclosed aspect, the optical system includes at least one mirror (100, 500, 600) having an optical effective surface (101, 501, 601) and a mirror substrate (110, 510, 610), wherein at least one cooling channel (115, 515, 615) in which a cooling fluid is configured to flow is arranged in the mirror substrate, for dissipating heat that is generated in the mirror substrate due to absorption of electromagnetic radiation incident from a light source on the optical effective surface, and a unit (135, 535, 635) to adjust the temperature and/or the flow rate of the cooling fluid either dependent on a measured quantity that characterizes the thermal load in the mirror substrate or dependent on an estimated/expected thermal load in the mirror substrate for a given power of the light source.

公开(公告)号：US20190163066A1

公开(公告)日：2019-05-30

申请号：US16097640

申请日：2017-04-05

Applicant: ASML NETHERLANDS B.V.

Inventor： Gijs KRAMER ,  Martijn HOUBEN ,  Nicholas Peter WATERSON ,  Thibault Simon Mathieu LAURENT ,  Yuri Johannes Gabriël VAN DE VIJVER ,  Marcus Martinus Petrus Adrianus VERMEULEN ,  Simon Karel RAVENSBERGEN ,  Vincentius Fransiscus CLOOSTERMAN ,  Siegfried Alexander TROMP ,  Coen Hubertus Matheus BALTIS ,  Justin Johannes Hermanus GERRITZEN ,  Niek Jacobus Johannes ROSET

IPC: G03F7/20

CPC classification number: G03F7/2041 ,  G03F7/70341 ,  G03F7/707 ,  G03F7/70716 ,  G03F7/70733

Abstract: An extraction body for a support apparatus of a lithographic apparatus. The support apparatus is configured to support an object. The extraction body is formed with an opening at a surface thereof. The opening extends within the extraction body forming a first passageway. The first passageway is configured to fluidly communicate an extraction channel in the extraction body to liquid between the surface and the object. A first pressure in the extraction channel is less than ambient pressure. At least a part of the first passageway is sized and dimensioned such that when the liquid enters the first passageway via the opening, a second pressure in the first passageway associated with surface tension of the liquid is lower than the first pressure such that at least a portion of the liquid is retained in the first passageway.