公开(公告)号：US20190196341A1

公开(公告)日：2019-06-27

申请号：US16328750

申请日：2017-08-18

Applicant: ASML HOLDING N.V. ,  ASML NETHERLANDS B.V.

Inventor： Kevin J VIOLETTE ,  Igor Matheus Petronella AARTS ,  Haico Victor KOK ,  Eric Brian CATEY

IPC: G03F7/20 ,  G03F9/00

Abstract: A method, including printing an apparatus mark onto a structure while the structure is at least partly within a lithographic apparatus. The structure may be part of, or is located on, a substrate table, but is separate from a substrate to be held by the apparatus. The method further includes measuring the apparatus mark using a sensor system within the apparatus.