公开(公告)号：US10222711B2

公开(公告)日：2019-03-05

申请号：US15838572

申请日：2017-12-12

Applicant: ASML NETHERLANDS B. V.

Inventor： Koen Jacobus Johannes Maria Zaal ,  Joost Jeroen Ottens

IPC: G03F7/20

Abstract: A lithographic apparatus with a cover plate formed separately from a substrate table, the cover plate configured to be to a side of the substrate during exposure, the cover plate being removable from the substrate table and supported on the substrate table by a protrusion. The lithographic apparatus further includes a linear encoder system configured to measure at least translation of the substrate table, a part of the linear encoder system being on the substrate table and located outward of the cover plate.