公开(公告)号：US20180210348A1

公开(公告)日：2018-07-26

申请号：US15935670

申请日：2018-03-26

Applicant: ASML NETHERLANDS B. V.

Inventor： Takeshi KANEKO ,  Kornelis Tijmen Hoekerd

IPC: G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/70925 ,  G03F7/7095 ,  G03F7/70975

Abstract: An apparatus and method for cleaning a contaminated surface of a lithographic apparatus are provided. A liquid confinement structure comprises at least two openings used to supply and extract liquid to a gap below the structure. The direction of flow between the openings can be switched. Liquid may be supplied to the gap radially outward of an opening adapted for dual flow. Supply and extraction lines to respectively supply liquid to and extract liquid from the liquid confinement structure have an inner surface that is resistant to corrosion by an organic liquid. A corrosive cleaning fluid can be used to clean photo resist contamination.