公开(公告)号：US20190212654A1

公开(公告)日：2019-07-11

申请号：US16355116

申请日：2019-03-15

申请人： Carl Zeiss SMT GmbH

发明人： Eric EVA

IPC分类号： G03F7/20 ,  G02B1/10

CPC分类号： G03F7/702 ,  B22F2998/10 ,  B22F2999/00 ,  C22C32/0021 ,  C22C47/04 ,  C22C47/14 ,  C22C49/02 ,  C22C49/06 ,  G02B1/10 ,  G03F7/70033 ,  G03F7/70075 ,  G03F7/70116 ,  G03F7/7015 ,  G03F7/7095 ,  B22F3/20 ,  B22F3/105 ,  B22F3/14 ,  B22F3/15 ,  B22F3/24 ,  B22F2003/242 ,  B22F2003/245 ,  B22F2003/247

摘要： A component for a mirror array for EUV lithography, particularly for use in faceted mirrors in illumination systems of EUV lithography devices. A component (500) for a mirror array for EUV lithography is proposed which is at least partially made from a composite material including matrix material (502) that contains copper and/or aluminium, and reinforcing material in the form of fibers (504). The composite material also includes particles (508) that consist of one or more of the materials from the group: graphite, adamantine carbon, and ceramic.

公开(公告)号：US20180259844A1

公开(公告)日：2018-09-13

申请号：US15917947

申请日：2018-03-12

申请人： Samsung Electronics Co., Ltd.

发明人： Hyeonjin Shin ,  Hyunjae Song ,  Minhyun Lee ,  Yeonchoo Cho

IPC分类号： G03F1/62 ,  G03F1/64 ,  G03F1/22 ,  G03F7/20

CPC分类号： G03F7/70983 ,  G03F1/22 ,  G03F1/62 ,  G03F1/64 ,  G03F7/70283 ,  G03F7/7095 ,  G03F7/70958

摘要： A pellicle for a photomask, a reticle including the same, and an exposure apparatus for lithography are provided. The pellicle may include a pellicle membrane and a passivation member. The pellicle membrane may include a carbon-based material having defects. The passivation member may cover the defects of the carbon-based material. The passivation member may include an inorganic material. The passivation member may be disposed on one or two surfaces of the pellicle membrane. The pellicle for the photomask may be applied to extreme ultraviolet (EUV) lithography.

公开(公告)号：US20180239252A1

公开(公告)日：2018-08-23

申请号：US15525626

申请日：2015-11-04

申请人： ASML Netherlands B.V.

发明人： Han-Kwang NIENHUYS ,  Sjoerd Nicolaas Lambertus DONDERS ,  Gosse Charles DE VRIES ,  Michael Josef Mathijs RENKENS ,  Erik Roelof LOOPSTRA

IPC分类号： G03F7/20

CPC分类号： G03F7/70891 ,  G02B5/1838 ,  G02B5/1861 ,  G02B7/1815 ,  G03F7/2008 ,  G03F7/70266 ,  G03F7/7095

摘要： A reflector (2) comprising a plate (4) supported by a substrate (8), wherein the plate has a reflective surface (5) and is secured to the substrate by adhesive free bonding, and wherein a cooling channel array (10) is provided in the reflector. The channels (16) of the cooling channel array may be formed from open channels in a surface of the substrate, the open channels being closed by the plate to create the channels.

公开(公告)号：US20180164703A1

公开(公告)日：2018-06-14

申请号：US15879755

申请日：2018-01-25

申请人： NIKON CORPORATION

发明人： W. Thomas NOVAK ,  Andrew J. HAZELTON ,  Douglas C. WATSON

IPC分类号： G03F7/20

CPC分类号： G03F7/70866 ,  G03F7/70341 ,  G03F7/7095

摘要： An immersion lithography apparatus includes: an optical assembly including a plano-convex lens as a last optical element, the optical assembly configured to project an image onto a substrate through an immersion liquid; a containment member that surrounds a last portion of the optical assembly, the containment member having a channel via which the immersion liquid recovered from a gap between the containment member and the substrate and/or a stage holding the substrate is removed; an outlet above a bottom surface of the last optical element, via which the immersion liquid is released to a space between the optical assembly and the containment member; and an immersion liquid source apparatus from which the immersion liquid is delivered to the outlet, the immersion liquid source apparatus having a flow controller, and a flow sensor that measures a rate of a flow of the immersion liquid to be delivered to the outlet.

公开(公告)号：US09996015B2

公开(公告)日：2018-06-12

申请号：US15432082

申请日：2017-02-14

申请人： Carl Zeiss SMT GmbH

发明人： Jens Prochnau ,  Dirk Schaffer ,  Andreas Wurmbrand ,  Bernhard Gellrich ,  Markus Kern

IPC分类号： G03B27/54 ,  G03F7/20 ,  G02B5/08 ,  G02B7/18

CPC分类号： G03F7/7095 ,  G02B5/0891 ,  G02B7/181 ,  G03F7/70883 ,  G03F7/709

摘要： The disclosure relates to a mirror module, in particular for a microlithographic projection exposure apparatus, including a mirror, which has a mirror body and an optically effective surface. The mirror body has a first material, and a supporting structure for connecting the mirror body to an objective structure. The supporting structure has a second material. The first material and the second material differ in terms of their coefficients of thermal expansion by less than 0.5*10−6K−1 in a temperature range around an operating temperature which is reached by the mirror module during operation in the region of the connection of the mirror body to the supporting structure.

公开(公告)号：US20180067398A1

公开(公告)日：2018-03-08

申请号：US15314841

申请日：2015-05-07

申请人： ASML Netherlands B.V.

发明人： Rogier Hendrikus Magdalena CORTIE ,  Christianus Wilhelmus Berendsen ,  Andre Bernardus Jeunink ,  Adrianus Hendrik Koevoets ,  Jim Vincent Overkamp ,  Sigfried Alexander Tromp ,  Van Vuong Vy ,  Daniel Elza Roeland Audenaerdt

IPC分类号： G03F7/20

CPC分类号： G03F7/7095 ,  G03F7/70341 ,  G03F7/70733 ,  G03F7/70875 ,  G03F7/70891

摘要： A lithographic apparatus comprising: a channel (46) for the passage therethrough of a two phase flow, wherein the channel is formed within a block, the block being of a first material (100); a second material (160) between the first material and the channel, wherein the second material has a specific heat capacity higher than that of the first material; and a third material (90) between the second material and the channel, wherein the third material has a thermal conductivity higher than that of the second material.

公开(公告)号：US20180046095A1

公开(公告)日：2018-02-15

申请号：US15795227

申请日：2017-10-26

申请人： ASML NETHERLANDS B.V.

发明人： Timotheus Franciscus SENGERS ,  Sjoerd Nicolaas Lambertus DONDERS ,  Hans JANSEN ,  Arjen BOOGAARD

IPC分类号： G03F7/20

CPC分类号： G03F7/70866 ,  G03F7/70341 ,  G03F7/70591 ,  G03F7/7085 ,  G03F7/7095

摘要： In a lithographic projection apparatus, a liquid supply system maintains liquid in a space between a projection system of the lithographic projection apparatus and a substrate. A sensor positioned on a substrate table, which holds the substrate, is configured to be exposed to radiation when immersed in liquid (e.g., under the same conditions as the substrate will be exposed to radiation). By having a surface of an absorption element of the sensor, that is to be in contact with liquid, formed of no more than one metal type, long life of the sensor may be obtained.

公开(公告)号：US09804509B2

公开(公告)日：2017-10-31

申请号：US15452403

申请日：2017-03-07

申请人： ASML NETHERLANDS B.V.

发明人： Timotheus Franciscus Sengers ,  Sjoerd Nicolaas Lambertus Donders ,  Hans Jansen ,  Arjen Boogaard

IPC分类号： G03B27/42 ,  G03F7/20

CPC分类号： G03F7/70866 ,  G03F7/70341 ,  G03F7/70591 ,  G03F7/7085 ,  G03F7/7095

摘要： In a lithographic projection apparatus, a liquid supply system maintains liquid in a space between a projection system of the lithographic projection apparatus and a substrate. A sensor positioned on a substrate table, which holds the substrate, is configured to be exposed to radiation when immersed in liquid (e.g., under the same conditions as the substrate will be exposed to radiation). By having a surface of an absorption element of the sensor, that is to be in contact with liquid, formed of no more than one metal type, long life of the sensor may be obtained.

公开(公告)号：US09785055B2

公开(公告)日：2017-10-10

申请号：US14399137

申请日：2013-05-07

申请人： ASML Netherlands B.V.

发明人： Thibault Simon Mathieu Laurent ,  Johannes Henricus Wilhelmus Jacobs ,  Wilhelmus Franciscus Johannes Simons ,  Martijn Houben ,  Raymond Wilhelmus Louis Lafarre ,  Koen Steffens ,  Han Henricus Aldegonda Lempens ,  Rogier Hendrikus Magdalena Cortie ,  Ruud Hendrikus Martinus Johannes Bloks ,  Gerben Pieterse ,  Siegfried Alexander Tromp ,  Theodorus Wilhelmus Polet ,  Jim Vincent Overkamp ,  Van Vuong Vy

IPC分类号： G03B27/52 ,  G03B27/58 ,  H02K41/02 ,  G03F7/20 ,  H01L21/68

CPC分类号： G03F7/70341 ,  G03F7/70716 ,  G03F7/70875 ,  G03F7/7095 ,  H01L21/682

摘要： An object table to support an object, the object table having a support body, an object holder to hold an object, an opening adjacent an edge of the object holder, and a channel in fluid communication with the opening via a passageway, wherein the channel is defined by a first material which is different to a second material defining the passageway.

公开(公告)号：US09746788B2

公开(公告)日：2017-08-29

申请号：US15293009

申请日：2016-10-13

申请人： ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

发明人： Nicolaas Rudolf Kemper ,  Henrikus Herman Marie Cox ,  Sjoerd Nicolaas Lambertus Donders ,  Roelof Frederik De Graaf ,  Christiaan Alexander Hoogendam ,  Nicolaas Ten Kate ,  Jeroen Johannes Sophia Maria Mertens ,  Frits Van Der Meulen ,  Franciscus Johannes Herman Maria Teunissen ,  Jan-Gerard Cornelis Van Der Toorn ,  Martinus Cornelis Maria Verhagen ,  Stefan Philip Christiaan Belfroid ,  Johannes Petrus Maria Smeulers ,  Herman Vogel

IPC分类号： G03B27/52 ,  G03F7/20

CPC分类号： G03F7/70883 ,  G03F7/70341 ,  G03F7/70858 ,  G03F7/70866 ,  G03F7/7095

摘要： A lithographic projection apparatus, including a liquid supply system configured to supply a liquid to a space between a projection system and a movable table; a member to at least partly confine liquid in the space, the member including a recovery opening facing toward the movable table, the recovery opening including a first porous structure configured to recover fluid; and a chamber configured to receive recovered fluid and to separate liquid from gas in the recovered fluid, the chamber including a second porous structure.