公开(公告)号：US20230176487A1

公开(公告)日：2023-06-08

申请号：US17922580

申请日：2021-05-03

Applicant: ASML NETHERLANDS B.V.

Inventor： Rogier Sebastiaan GILIJAMSE ,  Johan Gertrudis Cornelis KUNNEN ,  Marco Adrianus Peter VAN DEN HEUVEL ,  Boogyeong Zoo

IPC: G03F7/20

CPC classification number: G03F7/70533 ,  G03F7/7085 ,  G03F7/70783

Abstract: A substrate support system is provided that includes: a support part configured to support a bottom surface of a substrate on a support plane; a moveable part moveable between a retracted position, in which a top end of the moveable part is below the support plane, and an extended position, in which the top end of the moveable part is above the support plane, such that the top end supports the bottom surface of the substrate above the support plane in the extended position; and a measurement system configured to measure a time taken for the moveable part to move from the retracted position to the extended position, to compare the measured time with a reference time, and to generate a signal when the measured time deviates from the reference time by more than a predetermined amount.