公开(公告)号：US20210080837A1

公开(公告)日：2021-03-18

申请号：US16954384

申请日：2018-11-20

Applicant: ASML NETHERLANDS B.V.

Inventor： Manouk RIJPSTRA ,  Cornelis Johannes Henricus LAMBREGTS ,  Wim Tjibbo TEL ,  Sarathi ROY ,  Cédric Désiré GROUWSTRA ,  Chi-Fei NIEN ,  Weitian KOU ,  Chang-Wei CHEN ,  Pieter Gerardus Jacobus SMORENBERG

IPC: G03F7/20 ,  G05B19/404

Abstract: A method for determining a correction to a patterning process. The method includes obtaining a plurality of qualities of the patterning process (e.g., a plurality of parameter maps, or one or more corrections) derived from metrology data and data of an apparatus used in the patterning process, selecting, by a hardware computer system, a representative quality from the plurality of qualities, and determining, by the hardware computer system, a correction to the patterning process based on the representative quality.

公开(公告)号：US20210397152A1

公开(公告)日：2021-12-23

申请号：US17292586

申请日：2019-10-21

Applicant: ASML NETHERLANDS B.V.

Inventor： Chang-Wei CHEN ,  Si-Han ZENG

IPC: G05B19/042

Abstract: A user interface for designing, configuring and/or editing a control flow representing a control strategy associated with a semiconductor manufacturing process, the user interface including: a library of control elements having at least a control element representing a task of simulation and each control element being selectable by a user; a control flow editor configured to organize the control elements into a control flow representing the control strategy; and a communication interface for communicating the control flow to a calculation engine configured to evaluate the control flow.

公开(公告)号：US20220365446A1

公开(公告)日：2022-11-17

申请号：US17874582

申请日：2022-07-27

Applicant: ASML NETHERLANDS B.V.

Inventor： Manouk RIJPSTRA ,  Cornelis Johannes Henricus LAMBREGTS ,  Wim Tjibbo TEL ,  Sarathi ROY ,  Cédric Désiré GROUWSTRA ,  Chi-Fei NIEN ,  Weitian KOU ,  Chang-Wei CHEN ,  Pieter Gerardus Jacobus SMORENBERG

IPC: G03F7/20

Abstract: A method for determining a correction to a patterning process. The method includes obtaining a plurality of qualities of the patterning process (e.g., a plurality of parameter maps, or one or more corrections) derived from metrology data and data of an apparatus used in the patterning process, selecting, by a hardware computer system, a representative quality from the plurality of qualities, and determining, by the hardware computer system, a correction to the patterning process based on the representative quality.