公开(公告)号：US20240037897A1

公开(公告)日：2024-02-01

申请号：US18265431

申请日：2021-11-24

Applicant: ASML NETHERLANDS B.V.

Inventor： Danying LI ,  Meng LIU ,  Jen-Yi WUU ,  Rencheng SUN ,  Cong WU ,  Dean XU

IPC: G06V10/44 ,  G06T7/11 ,  G06V10/764

CPC classification number: G06V10/44 ,  G06T7/11 ,  G06V10/764

Abstract: An apparatus and method of feature extraction for identifying a pattern. An improved method includes obtaining data representative of a pattern instance, dividing the pattern instance into a plurality of zones, determining a representative characteristic of a zone of the plurality of zones, generating a representation of the pattern instance using a feature vector, wherein the feature vector includes an element corresponding to the representative characteristic, wherein the representative characteristic is indicative of a spatial distribution of one or more features of the zone. The method may also include classifying and/or selecting pattern instances based on the feature vector.

公开(公告)号：US20210247701A1

公开(公告)日：2021-08-12

申请号：US17053255

申请日：2019-05-21

Applicant: ASML NETHERLANDS B.V.

Inventor： Danying LI ,  Chi-Hsiang FAN ,  Adbalmohsen ELMALK ,  Youping ZHANG ,  Jay Jianhui CHEN ,  Kui-Jun HUANG

IPC: G03F7/20

Abstract: A method for determining a stack configuration for a substrate subjected to a patterning process. The method includes obtaining (i) measurement data of a stack configuration with location information on a printed substrate, (ii) a substrate model configured to predict a stack characteristic based on a location of the substrate, and (iii) a stack map including a plurality of stack configurations based on the substrate model. The method iteratively determines values of model parameters of the substrate model based on a fitting between the measurement data and the plurality of stack configurations of the stack map, and predicts an optimum stack configuration at a particular location based on the substrate model using the values of the model parameters.