公开(公告)号：US20220406563A1

公开(公告)日：2022-12-22

申请号：US17897080

申请日：2022-08-26

Applicant: ASML Netherlands B.V.

Inventor： Laura DEL TIN ,  Almut Johanna STEGEMANN ,  German AKSENOV ,  Diego MARTINEZ NEGRETE GASQUE ,  Pieter Lucas BRANDT

IPC: H01J37/317 ,  H01J37/12 ,  H01J37/28 ,  H01J37/09 ,  H01J37/20

Abstract: Disclosed herein is an multi-array lens configured in use to focus a plurality of beamlets of charged particles along a multi-beam path, wherein each lens in the array comprises: an entrance electrode; a focusing electrode and a support. The focusing electrode is down beam of the entrance electrode along a beamlet path and is configured to be at a potential different from the entrance electrode. The support is configured to support the focusing electrode relative to the entrance electrode. The focusing electrode and support are configured so that in operation the lens generates a rotationally symmetrical field around the beamlet path.

公开(公告)号：US20250125120A1

公开(公告)日：2025-04-17

申请号：US18984879

申请日：2024-12-17

Applicant: ASML Netherlands B.V.

Inventor： Laura DEL TIN ,  Almut Johanna STEGEMANN ,  German AKSENOV ,  Diego MARTINEZ NEGRETE GASQUE ,  Pieter Lucas BRANDT

IPC: H01J37/317 ,  H01J37/09 ,  H01J37/12 ,  H01J37/20 ,  H01J37/28

Abstract: Disclosed herein is an multi-array lens configured in use to focus a plurality of beamlets of charged particles along a multi-beam path, wherein each lens in the array comprises: an entrance electrode; a focussing electrode and a support. The focusing electrode is down beam of the entrance electrode along a beamlet path and is configured to be at a potential different from the entrance electrode. The support is configured to support the focusing electrode relative to the entrance electrode. The focusing electrode and support are configured so that in operation the lens generates a rotationally symmetrical field around the beamlet path.

公开(公告)号：US20240355575A1

公开(公告)日：2024-10-24

申请号：US18759499

申请日：2024-06-28

Applicant: ASML NETHERLANDS B.V.

Inventor： German AKSENOV ,  Vincent Claude BEUGIN ,  Pieter Lucas BRANDT

IPC: H01J37/147 ,  H01J37/28

CPC classification number: H01J37/1472 ,  H01J37/28

Abstract: Disclosed herein is a manipulator or an array of manipulator. A manipulator manipulates a charged particle beam in a projection system. The manipulator comprising a substrate with major surfaces and a through-passage between associated apertures in the major surfaces. The through passage configured for passage of a path of a charged particle beam. An inner wall of the through-passage between the major surfaces comprises a plurality of electrodes configured to manipulate the charged particle beam. Each electrode comprises doped substrate. The through-passage comprises recesses that extend away from the path of the charged particle beam. Each recess defines a gap between the adjacent electrodes and further comprising an electrically insulating region between the adjacent electrodes. The recesses extend behind at least one of the adjacent electrodes relative to the path of the charged particle beam and comprising at least part of the electrically insulating region.