公开(公告)号：US20250125120A1

公开(公告)日：2025-04-17

申请号：US18984879

申请日：2024-12-17

Applicant: ASML Netherlands B.V.

Inventor： Laura DEL TIN ,  Almut Johanna STEGEMANN ,  German AKSENOV ,  Diego MARTINEZ NEGRETE GASQUE ,  Pieter Lucas BRANDT

IPC: H01J37/317 ,  H01J37/09 ,  H01J37/12 ,  H01J37/20 ,  H01J37/28

Abstract: Disclosed herein is an multi-array lens configured in use to focus a plurality of beamlets of charged particles along a multi-beam path, wherein each lens in the array comprises: an entrance electrode; a focussing electrode and a support. The focusing electrode is down beam of the entrance electrode along a beamlet path and is configured to be at a potential different from the entrance electrode. The support is configured to support the focusing electrode relative to the entrance electrode. The focusing electrode and support are configured so that in operation the lens generates a rotationally symmetrical field around the beamlet path.

公开(公告)号：US20220406563A1

公开(公告)日：2022-12-22

申请号：US17897080

申请日：2022-08-26

Applicant: ASML Netherlands B.V.

Inventor： Laura DEL TIN ,  Almut Johanna STEGEMANN ,  German AKSENOV ,  Diego MARTINEZ NEGRETE GASQUE ,  Pieter Lucas BRANDT

IPC: H01J37/317 ,  H01J37/12 ,  H01J37/28 ,  H01J37/09 ,  H01J37/20

Abstract: Disclosed herein is an multi-array lens configured in use to focus a plurality of beamlets of charged particles along a multi-beam path, wherein each lens in the array comprises: an entrance electrode; a focusing electrode and a support. The focusing electrode is down beam of the entrance electrode along a beamlet path and is configured to be at a potential different from the entrance electrode. The support is configured to support the focusing electrode relative to the entrance electrode. The focusing electrode and support are configured so that in operation the lens generates a rotationally symmetrical field around the beamlet path.

公开(公告)号：US20210391139A1

公开(公告)日：2021-12-16

申请号：US17344446

申请日：2021-06-10

Applicant: ASML Netherlands B.V.

Inventor： Christiaan OTTEN ,  Peter-Paul CRANS ,  Marc SMITS ,  Laura DEL TIN ,  Christan TEUNISSEN ,  Yang-Shan HUANG ,  Stijn Wilem, Herman, Karel STEENBRINK ,  Xuerang HU ,  Qingpo XI ,  Xinan LUO ,  Xuedong LIU

IPC: H01J37/20 ,  H01J37/28 ,  H01J37/18 ,  H01J37/14 ,  H01J37/147 ,  H01J37/244

Abstract: Disclosed herein is a module for supporting a device configured to manipulate charged particle paths in a charged particle apparatus, the module comprising: a support arrangement configured to support the device, wherein the device is configured to manipulate a charged particle path within the charged particle apparatus; and a support positioning system configured to move the support arrangement within the module; wherein the module is arranged to be field replaceable in the charged particle apparatus.