公开(公告)号：US20170285488A1

公开(公告)日：2017-10-05

申请号：US15624419

申请日：2017-06-15

Applicant: ASML NETHERLANDS B.V.

Inventor： Hans Jansen ,  Johannes Jacobus Matheus Baselmans ,  Sjoerd Nicolaas Lambertus Donders ,  Christiaan Alexander Hoogendam ,  Jeroen Johannes Sophia Maria Mertens ,  Johannes Catharinus Huberts Mulkens ,  Marco Koert Stavenga ,  Bob Streefkerk ,  Jan Cornelis Van Der Hoeven ,  Cedric Desire Grouwstra

IPC: G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/70925

Abstract: A method and apparatus for cleaning the inside of an immersion lithographic apparatus is disclosed. In particular, a liquid supply system of the lithographic apparatus may be used to introduce a cleaning fluid into a space between the projection system and the substrate table of the lithographic apparatus. Additionally or alternatively, a cleaning device may be provided on the substrate table and an ultrasonic emitter may be provided to create an ultrasonic cleaning liquid.