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公开(公告)号：US10241055B2
公开(公告)日：2019-03-26
申请号：US14264547
申请日：2014-04-29
Applicant: ASML Netherlands B.V.
Inventor： Arie Jeffrey Maria Den Boef , Arno Jan Bleeker , Youri Johannes Laurentius Maria Van Dommelen , Mircea Dusa , Antoine Gaston Marie Kiers , Paul Frank Luehrmann , Henricus Petrus Maria Pellemans , Maurits Van Der Schaar , Cedric Desire Grouwstra , Markus Gerardus Martinus Van Kraaij
Abstract: An apparatus and method to determine a property of a substrate by measuring, in the pupil plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation being reflected off the substrate. The property may be angle and wavelength dependent and may include the intensity of TM- and TE-polarized radiation and their relative phase difference.
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Patent Agency Ranking
公开(公告)号：US10509326B2
公开(公告)日：2019-12-17
申请号：US15624419
申请日：2017-06-15
Applicant: ASML NETHERLANDS B.V.
Inventor： Hans Jansen , Johannes Jacobus Matheus Baselmans , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Marco Koert Stavenga , Bob Streefkerk , Jan Cornelis Van Der Hoeven , Cedric Desire Grouwstra
Abstract: A method and apparatus for cleaning the inside of an immersion lithographic apparatus is disclosed. In particular, a liquid supply system of the lithographic apparatus may be used to introduce a cleaning fluid into a space between the projection system and the substrate table of the lithographic apparatus. Additionally or alternatively, a cleaning device may be provided on the substrate table and an ultrasonic emitter may be provided to create an ultrasonic cleaning liquid.
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公开(公告)号：US20170285488A1
公开(公告)日：2017-10-05
申请号：US15624419
申请日：2017-06-15
Applicant: ASML NETHERLANDS B.V.
Inventor： Hans Jansen , Johannes Jacobus Matheus Baselmans , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Huberts Mulkens , Marco Koert Stavenga , Bob Streefkerk , Jan Cornelis Van Der Hoeven , Cedric Desire Grouwstra
IPC: G03F7/20
CPC classification number: G03F7/70341 , G03F7/70925
Abstract: A method and apparatus for cleaning the inside of an immersion lithographic apparatus is disclosed. In particular, a liquid supply system of the lithographic apparatus may be used to introduce a cleaning fluid into a space between the projection system and the substrate table of the lithographic apparatus. Additionally or alternatively, a cleaning device may be provided on the substrate table and an ultrasonic emitter may be provided to create an ultrasonic cleaning liquid.
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公开(公告)号：US20140055788A1
公开(公告)日：2014-02-27
申请号：US14011663
申请日：2013-08-27
Applicant: ASML Netherlands B.V.
Inventor： Arie Jeffrey Maria DEN BOEF , Arno Jan Bleeker , Youri Johannes Laurentius Maria Van Dommelen , Mircea Dusa , Antoine Gaston Marie Kiers , Paul Frank Luehrmann , Henricus Petrus Maria Pellemans , Maurits Van Der Schaar , Cedric Desire Grouwstra , Markus Gerardus Martinus Van Kraaij
IPC: G03F7/20
CPC classification number: G01N21/8806 , G03F7/70341 , G03F7/70633 , G03F7/7065 , G03F9/7034
Abstract: An apparatus and method to determine a property of a substrate by measuring, in the pupil plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation being reflected off the substrate. The property may be angle and wavelength dependent and may include the intensity of TM- and TE-polarized radiation and their relative phase difference.
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公开(公告)号：US10955353B2
公开(公告)日：2021-03-23
申请号：US16270155
申请日：2019-02-07
Applicant: ASML Netherlands B.V.
Inventor： Arie Jeffrey Den Boef , Arno Jan Bleeker , Youri Johannes Laurentius Maria Van Dommelen , Mircea Dusa , Antoine Gaston Marie Kiers , Paul Frank Luehrmann , Henricus Petrus Maria Pellemans , Maurits Van Der Schaar , Cedric Desire Grouwstra , Markus Gerardus Martinus Maria Van Kraaij
Abstract: An apparatus and method to determine a property of a substrate by measuring, in the pupil plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation being reflected off the substrate. The property may be angle and wavelength dependent and may include the intensity of TM- and TE-polarized radiation and their relative phase difference.
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公开(公告)号：US09703210B2
公开(公告)日：2017-07-11
申请号：US14584826
申请日：2014-12-29
Applicant: ASML NETHERLANDS B.V.
Inventor： Hans Jansen , Johannes Jacobus Matheus Baselmans , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Marco Koert Stavenga , Bob Streefkerk , Jan Cornelis Van Der Hoeven , Cedric Desire Grouwstra
CPC classification number: G03F7/70341 , G03F7/70925
Abstract: A method and apparatus for cleaning the inside of an immersion lithographic apparatus is disclosed. In particular, a liquid supply system of the lithographic apparatus may be used to introduce a cleaning fluid into a space between the projection system and the substrate table of the lithographic apparatus. Additionally or alternatively, a cleaning device may be provided on the substrate table and an ultrasonic emitter may be provided to create an ultrasonic cleaning liquid.
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