公开(公告)号：US20150338753A1

公开(公告)日：2015-11-26

申请号：US14409048

申请日：2013-06-13

Applicant: ASML Netherlands B.V.

Inventor： Michel RIEPEN ,  Dzmitry LEBETSKI ,  Wilbert Jan MESTROM ,  Wim Ronald KAMPINGA ,  Jan Okke NIEUWENKAMP ,  Jacob BRINKERT ,  Henricus Jozef CASTELIJNS ,  Nicolaas TEN KATE ,  Hendrikus Gijsbertus SCHIMMEL ,  Hans JANSEN ,  Dennis Jozef Maria PAULUSSEN ,  Brian Vernon VIRGO ,  Reinier Theodorus Martinus JILISEN ,  Ramin BADIE ,  Albert Pieter RIJPMA ,  Johannes Christiaan Leonardus FRANKEN ,  Peter VAN PUTTEN ,  Gerrit VAN DER STRAATEN

IPC: G03F7/20 ,  G21K5/08 ,  F15D1/00 ,  H05G2/00

CPC classification number: G03F7/70983 ,  F15D1/0065 ,  G03F7/70033 ,  G03F7/70916 ,  G21K1/06 ,  G21K5/08 ,  H05G2/005 ,  H05G2/008 ,  Y10T137/206

Abstract: A radiation source comprising a fuel source configured to deliver fuel to a location from which the fuel emits EUV radiation. The radiation source further comprises an immobile fuel debris receiving surface provided with a plurality of grooves. The grooves have orientations which are arranged to direct the flow of liquid fuel under the influence of gravity in one or more desired directions.

Abstract translation: 一种辐射源，包括燃料源，其构造成将燃料输送到燃料发射EUV辐射的位置。 辐射源还包括设置有多个凹槽的不动的燃料碎屑接收表面。 凹槽具有定向，其布置成在一个或多个所需方向上在重力的影响下引导液体燃料的流动。

公开(公告)号：US20230384276A1

公开(公告)日：2023-11-30

申请号：US18032438

申请日：2021-09-27

Applicant: ASML Netherlands B.V.

Inventor： Reinier Theodorus Martinus JILISEN ,  Maarten Jan HEERKENS ,  Hendrikus Petrus KLUIJTMANS ,  Robbert Willem Frederik OOSTERBAAN ,  Antonius Marinus Coenraad Petrus Leonardus VAN DE KERKHOF

IPC: G01N33/00 ,  G01N27/64

CPC classification number: G01N33/0006 ,  G01N27/64

Abstract: Disclosed herein is a residual gas analyser for detecting gas in a vacuum tool, the residual gas analyser comprising: one or more ion sources configured to ionise a gas in the residual gas analyser; one or more detectors configured to detect an ionised gas by the ion source; and one or more gas generating filaments configured to generate gas within the residual gas analyser.

公开(公告)号：US20160278196A1

公开(公告)日：2016-09-22

申请号：US15035983

申请日：2014-10-23

Applicant: ASML NETHERLANDS B.V.

Inventor： Rolf Theodorus Nicolaas BEIJSENS ,  Kornelis Frits FEENSTRA ,  Arjen Teake DE JONG ,  Reinier Theodorus Martinus JILISEN ,  Niek Antonius Jacobus Maria KLEEMANS ,  Andrey NIKIPELOV ,  Pavel SEROGLAZOV ,  Nicolaas Antonius Allegondus Johannes VAN ASTEN ,  Harald Ernest VERBRAAK

IPC: H05G2/00

Abstract: A radiation system to generate a radiation emitting plasma, the radiation system include a fuel emitter to provide a fuel target at a plasma formation region, a first laser arranged to provide a first laser beam at the plasma formation region incident on the fuel target to generate a radiation emitting plasma, an imaging device arranged to obtain a first image of the radiation emitting plasma at the plasma formation region, the first image indicating at least one image property of the radiation emitting plasma, and a controller. The controller is arranged to receive the first image, and to generate at least one instruction based on the at least one image property of the radiation emitting plasma to modify operation of at least one component of the radiation system to reduce a detrimental effect of debris.

Abstract translation: 一种用于产生辐射发射等离子体的辐射系统，所述辐射系统包括燃料发射器，以在等离子体形成区域处提供燃料靶;布置成在入射到燃料靶上的等离子体形成区域处提供第一激光束的第一激光器，以产生 辐射发射等离子体，成像装置，被配置为获得等离子体形成区域处的发射等离子体的第一图像，第一图像表示发射等离子体的至少一个图像特性，以及控制器。 控制器布置成接收第一图像，并且基于辐射发射等离子体的至少一个图像特性生成至少一个指令，以修改辐射系统的至少一个分量的操作，以减少碎片的有害影响。

公开(公告)号：US20230083834A1

公开(公告)日：2023-03-16

申请号：US17909348

申请日：2021-03-01

Applicant: ASML Holding N.V. ,  ASML Netherlands B.V.

Inventor： Joseph Harry LYONS ,  Jimi HENDRIKS ,  Ping ZHOU ,  Zhuangxiong HUANG ,  Reinier Theodorus Martinus JILISEN

IPC: G03F7/20

Abstract: Embodiments herein describe methods, devices, and systems for rupture detection and end-of-life monitoring of dynamic gas lock (DGL) membranes and pupil facet mirrors in lithographic apparatuses. A method for detecting rupture of a dynamic gas lock membrane in a lithographic apparatus includes illuminating the dynamic gas lock membrane with a measurement beam using a radiation source, in which the dynamic gas lock membrane is arranged between a wafer and projection optics of the lithography apparatus, and determining whether any radiation from the measurement beam is reflected from the dynamic gas lock membrane by using reflection collection optics, in which the reflection collection optics are arranged above the dynamic gas lock membrane. A rupture in the dynamic gas lock membrane is detected if no radiation is reflected from the dynamic gas lock membrane. If radiation is reflected from the dynamic gas lock membrane, the dynamic gas lock membrane is not ruptured.

公开(公告)号：US20160252821A1

公开(公告)日：2016-09-01

申请号：US15037024

申请日：2014-12-08

Applicant: ASML NETHERLANDS B.V.

Inventor： Arjen Teake DE JONG ,  Robertus Wilhelmus VELTMAN ,  Reinier Theodorus Martinus JILISEN

IPC: G03F7/20

CPC classification number: G03F7/70033 ,  G03F7/70058 ,  G03F7/70175 ,  G03F7/70916 ,  G03F7/70933 ,  H05G2/005 ,  H05G2/008

Abstract: A radiation source, e.g. for EUV for use in a lithographic apparatus, generates radiation by illuminating droplets of fuel with first radiation to form a plasma and collects second radiation omitted by the plasma using a collector (CO). The collector has an aperture and the fuel passes along a vertical trajectory through that aperture before being irradiated by the first radiation. In an embodiment the first radiation is directed along a beam, the final part of which is coincident with the final part of the trajectory of the fuel droplets. In an embodiment a gas flow is arranged coincident with the fuel trajectory and/or the beam of first radiation.

Abstract translation: 辐射源，例如 对于在光刻设备中使用的EUV，通过用第一辐射照射燃料的液滴来产生辐射以形成等离子体并且使用收集器（CO）收集等离子体所省略的第二辐射。 收集器具有孔，并且燃料在被第一辐射照射之前沿着穿过该孔的垂直轨迹通过。 在一个实施例中，第一辐射是沿着梁，其最后部分与燃料液滴的轨迹的最后部分重合。 在一个实施例中，气流被布置成与燃料轨迹和/或第一辐射束重合。