公开(公告)号：US20160252821A1

公开(公告)日：2016-09-01

申请号：US15037024

申请日：2014-12-08

Applicant: ASML NETHERLANDS B.V.

Inventor： Arjen Teake DE JONG ,  Robertus Wilhelmus VELTMAN ,  Reinier Theodorus Martinus JILISEN

IPC: G03F7/20

CPC classification number: G03F7/70033 ,  G03F7/70058 ,  G03F7/70175 ,  G03F7/70916 ,  G03F7/70933 ,  H05G2/005 ,  H05G2/008

Abstract: A radiation source, e.g. for EUV for use in a lithographic apparatus, generates radiation by illuminating droplets of fuel with first radiation to form a plasma and collects second radiation omitted by the plasma using a collector (CO). The collector has an aperture and the fuel passes along a vertical trajectory through that aperture before being irradiated by the first radiation. In an embodiment the first radiation is directed along a beam, the final part of which is coincident with the final part of the trajectory of the fuel droplets. In an embodiment a gas flow is arranged coincident with the fuel trajectory and/or the beam of first radiation.

Abstract translation: 辐射源，例如 对于在光刻设备中使用的EUV，通过用第一辐射照射燃料的液滴来产生辐射以形成等离子体并且使用收集器（CO）收集等离子体所省略的第二辐射。 收集器具有孔，并且燃料在被第一辐射照射之前沿着穿过该孔的垂直轨迹通过。 在一个实施例中，第一辐射是沿着梁，其最后部分与燃料液滴的轨迹的最后部分重合。 在一个实施例中，气流被布置成与燃料轨迹和/或第一辐射束重合。