公开(公告)号：US11860554B2

公开(公告)日：2024-01-02

申请号：US17606785

申请日：2020-03-27

Applicant: ASML NETHERLANDS B.V.

Inventor： Mark Johannes Hermanus Frencken ,  Theodorus Marcus Nagtegaal ,  Oleg Viacheslavovich Voznyi

IPC: G03F7/00

CPC classification number: G03F7/70783 ,  G03F7/7075 ,  G03F7/70875

Abstract: The invention provides an object positioner comprising:—an object support having an object support surface which is configured to engage at least a part of an object, said object support surface having a support surface temperature,—a thermal device, which thermal device is configured to provide at least a part of the object with a first object temperature, which first object temperature differs from the support surface temperature by a first predetermined temperature difference.

公开(公告)号：US11556064B2

公开(公告)日：2023-01-17

申请号：US17269328

申请日：2019-07-22

Applicant: ASML Netherlands B.V.

Inventor： Gijs Kramer ,  Theodorus Marcus Nagtegaal ,  André Schreuder ,  Anna Catharina Verkaik

IPC: G03F7/20

Abstract: The invention provides a stage apparatus, comprising an object support comprising a ring shaped protrusion having an outer radius in a first plane, and configured to support an object with a radius in the first plane larger than the outer radius of the ring shaped protrusion. The stage apparatus further comprises a sensor module configured to detect the object support, and the object when it is arranged on the object support. The stage apparatus further comprises a processing unit configured to receive one or more signals from the sensor module, and to determine, based on said one or more signals, a position of the object relative to the ring shaped protrusion when the object is arranged on the object support. The processing unit is further configured to determine, based on said position of the object, an offset value representing the position of the object relative to the ring shaped protrusion.