公开(公告)号：US11644755B2

公开(公告)日：2023-05-09

申请号：US17279648

申请日：2019-09-11

Applicant: ASML NETHERLANDS B.V.

Inventor： Bearrach Moest ,  Rowin Meijerink ,  Thijs Schenkelaars ,  Norbertus Josephus Martinus Van Den Nieuwelaar ,  Laurentius Johannes Adrianus Van Bokhoven

IPC: G03F7/20

CPC classification number: G03F7/705 ,  G03F7/706 ,  G03F7/70358 ,  G03F7/70983

Abstract: A method of predicting deflection of a pellicle which will occur during movement of the pellicle in a lithographic apparatus, the method including receiving parameters regarding properties of the pellicle and receiving parameters regarding the expected movement of the pellicle. The parameters are applied to a model which predicts deflection of the pellicle as a function of those parameters. The model includes a plurality of sub-models which relate to different components of deflection of the pellicle. An output of the model may be used to predict.