公开(公告)号：US09964865B2

公开(公告)日：2018-05-08

申请号：US15142671

申请日：2016-04-29

Applicant: ASML NETHERLANDS B.V.

Inventor： Cédric Désiré Grouwstra ,  Nicolaas Rudolf Kemper ,  Norbertus Josephus Martinus Van Den Nieuwelaar ,  Dirk De Vries ,  Hua Li ,  Marinus Jochemsen

IPC: G03B27/52 ,  G03F7/20

CPC classification number: G03F7/70775 ,  G03F7/70341 ,  G03F7/70725

Abstract: A method of adjusting speed and/or routing of a part of a movement plan of a table under an immersion fluid supply system of a lithographic apparatus. The method includes splitting the movement plan of the table into a plurality of discrete movements; determining a risk of a bubble of a size greater than a certain size being present in immersion fluid through which a patterned beam of the lithographic apparatus will pass during a certain discrete movement by determining whether the immersion fluid supply system passes over a position at which immersion fluid leaked from the immersion fluid supply system is present; and adjusting the speed and/or routing of a part of the movement plan corresponding to (i) a discrete movement earlier than a discrete movement for which the risk of a bubble is determined, and/or (ii) a discrete movement for which the risk of a bubble is determined.

公开(公告)号：US09606457B2

公开(公告)日：2017-03-28

申请号：US13748889

申请日：2013-01-24

Applicant: ASML Netherlands B.V.

Inventor： Norbertus Josephus Martinus Van Den Nieuwelaar ,  Petrus Franciscus Van Gils ,  Arthur Erland Swaving

IPC: G03B27/42 ,  G03B27/58 ,  G03B27/32 ,  G03F7/20 ,  G03F7/00

CPC classification number: G03F7/7075 ,  G03F7/00 ,  G03F7/70533 ,  G03F7/70725 ,  G03F7/70733 ,  G03F7/70991

Abstract: A substrate handler for transferring substrates to be exposed from a track to a lithographic apparatus. The substrate handler comprises a controller. The controller is configured to determine an instance for starting a transfer process of a first one of the substrates. The instance is based on a predetermined processing characteristic of the lithographic apparatus, in order to maintain a transfer period of the substrate in the substrate handler substantially constant.

公开(公告)号：US11644755B2

公开(公告)日：2023-05-09

申请号：US17279648

申请日：2019-09-11

Applicant: ASML NETHERLANDS B.V.

Inventor： Bearrach Moest ,  Rowin Meijerink ,  Thijs Schenkelaars ,  Norbertus Josephus Martinus Van Den Nieuwelaar ,  Laurentius Johannes Adrianus Van Bokhoven

IPC: G03F7/20

CPC classification number: G03F7/705 ,  G03F7/706 ,  G03F7/70358 ,  G03F7/70983

Abstract: A method of predicting deflection of a pellicle which will occur during movement of the pellicle in a lithographic apparatus, the method including receiving parameters regarding properties of the pellicle and receiving parameters regarding the expected movement of the pellicle. The parameters are applied to a model which predicts deflection of the pellicle as a function of those parameters. The model includes a plurality of sub-models which relate to different components of deflection of the pellicle. An output of the model may be used to predict.

公开(公告)号：US10261422B2

公开(公告)日：2019-04-16

申请号：US15500866

申请日：2015-06-30

Applicant: ASML Netherlands B.V.

Inventor： Norbertus Josephus Martinus Van Den Nieuwelaar ,  Victor Manuel Blanco Carballo ,  Casper Roderik De Groot ,  Rolf Hendrikus Jacobus Custers ,  David Merritt Phillips ,  Frederik Antonius Van Der Zanden ,  Pieter Lein Joseph Gunter ,  Erik Henricus Egidius Catharina Eummelen ,  Yuri Johannes Gabriël Van De Vijver ,  Bert Dirk Scholten ,  Marijn Wouters ,  Ronald Frank Kox ,  Jorge Alberto Vieyra Salas

IPC: G03F7/20 ,  G02B27/00

Abstract: An immersion lithography apparatus has a controller configured to control a substrate table to move along an exposure route including in order: an entry motion in which the substrate moves from an off-substrate position at which the immersion space does not overlap the substrate to an on-substrate position at which the immersion space at least partially overlaps the substrate, a transfer motion in which the substrate table changes speed and/or direction and moves for at least a transfer time after the substrate moves to the on-substrate position, and an expose motion in which the substrate is scanned and the patterned beam is projected onto the substrate, wherein throughout the transfer motion at least a part of the immersion space overlaps the substrate and wherein the patterned beam is not projected onto the substrate during the entry motion and the transfer motion.