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公开(公告)号：US20200232933A1
公开(公告)日：2020-07-23
申请号：US16642402
申请日：2018-08-09
Applicant: ASML NETHERLANDS B.V.
IPC: G01N21/93 , G01N21/956 , G03F7/20
Abstract: A method for manufacturing or adjusting a reticle having a predetermined functionality, the method including obtaining a reticle having a first pattern, the first pattern representing a first functionality of structures provided to a substrate using the reticle, and patterning the reticle having the first pattern with a second pattern using a pattern generating tool, the combined first and second patterns having the predetermined functionality.
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