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公开(公告)号：US20240014078A1
公开(公告)日：2024-01-11
申请号：US18230115
申请日：2023-08-03
发明人： Adriaan Johan VAN LEEST , Anagnostis TSIATMAS , Paul Christiaan HINNEN , Elliott Gerard Mc NAMARA , Alok VERMA , Thomas THEEUWES , Hugo Augustinus Joseph CRAMER
CPC分类号： H01L22/12 , G03F7/70683 , G03F7/70633 , G03F9/7003 , G01N21/9501
摘要： A method of determining a parameter of a patterning process, the method including: obtaining a detected representation of radiation redirected by a structure having geometric symmetry at a nominal physical configuration, wherein the detected representation of the radiation was obtained by illuminating a substrate with a radiation beam such that a beam spot on the substrate was filled with the structure; and determining, by a hardware computer system, a value of the patterning process parameter based on optical characteristic values from an asymmetric optical characteristic distribution portion of the detected radiation representation with higher weight than another portion of the detected radiation representation, the asymmetric optical characteristic distribution arising from a different physical configuration of the structure than the nominal physical configuration.
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公开(公告)号：US20230141495A1
公开(公告)日：2023-05-11
申请号：US17916746
申请日：2021-03-10
发明人： Hugo Augustinus Joseph CRAMER , Patricius Aloysius Jacobus TINNEMANS , Jeroen Arnoldus Leonardus Johannes RAAYMAKERS , Jochem Sebastiaan WILDENBERG
IPC分类号： G03F7/20
CPC分类号： G03F7/70525 , G03F7/70625 , G03F7/70633
摘要： Disclosed is a method of determining a sampling scheme. The method comprises obtaining a parallel sensor description and identifying a plurality of candidate acquisition configurations based on said parallel sensor description and potential metrology locations. Each of said candidate acquisition configurations is evaluated in terms of an evaluation metric and a candidate acquisition configuration is selected based on said evaluation. The corresponding metrology locations for the selected acquisition configuration is added to the sampling scheme.
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公开(公告)号：US20190258177A1
公开(公告)日：2019-08-22
申请号：US16264755
申请日：2019-02-01
IPC分类号： G03F7/20
摘要： Disclosed is method of optimizing bandwidth of measurement illumination for a measurement application, and an associated metrology apparatus. The method comprises performing a reference measurement with reference measurement illumination having a reference bandwidth and performing one or more optimization measurements, each of said one or more optimization measurements being performed with measurement illumination having a varied candidate bandwidth. The one or more optimization measurements are compared with the reference measurement; and an optimal bandwidth for the measurement application is selected based on the comparison.
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公开(公告)号：US20170255112A1
公开(公告)日：2017-09-07
申请号：US15445612
申请日：2017-02-28
发明人： Adriaan Johan VAN LEEST , Anagnostis TSIATMAS , Paul Christiaan HINNEN , Elliott Gerard McNAMARA , Alok VERMA , Thomas THEEUWES , Hugo Augustinus Joseph CRAMER , Maria Isabel DE LA FUENTE VALENTIN , Koen VAN WITTEVEEN , Martijn Maria ZAAL , Shu-jin WANG
摘要： A metrology target includes: a first structure arranged to be created by a first patterning process; and a second structure arranged to be created by a second patterning process, wherein the first structure and/or second structure is not used to create a functional aspect of a device pattern, and wherein the first and second structures together form one or more instances of a unit cell, the unit cell having geometric symmetry at a nominal physical configuration and wherein the unit cell has a feature that causes, at a different physical configuration than the nominal physical configuration due to a relative shift in pattern placement in the first patterning process, the second patterning process and/or another patterning process, an asymmetry in the unit cell.
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公开(公告)号：US20210335678A1
公开(公告)日：2021-10-28
申请号：US17371380
申请日：2021-07-09
发明人： Adriaan Johan VAN LEEST , Anagnostis TSIATMAS , Paul Christiaan HINNEN , Elliott Gerard Mc NAMARA , Alok VERMA , Thomas THEEUWES , Hugo Augustinus Joseph CRAMER
摘要： A method of determining a parameter of a patterning process, the method including: obtaining a detected representation of radiation redirected by a structure having geometric symmetry at a nominal physical configuration, wherein the detected representation of the radiation was obtained by illuminating a substrate with a radiation beam such that a beam spot on the substrate was filled with the structure; and determining, by a hardware computer system, a value of the patterning process parameter based on optical characteristic values from an asymmetric optical characteristic distribution portion of the detected radiation representation with higher weight than another portion of the detected radiation representation, the asymmetric optical characteristic distribution arising from a different physical configuration of the structure than the nominal physical configuration.
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公开(公告)号：US20200319562A1
公开(公告)日：2020-10-08
申请号：US16903893
申请日：2020-06-17
摘要： Disclosed is method of optimizing bandwidth of measurement illumination for a measurement application, and an associated metrology apparatus. The method comprises performing a reference measurement with reference measurement illumination having a reference bandwidth and performing one or more optimization measurements, each of said one or more optimization measurements being performed with measurement illumination having a varied candidate bandwidth. The one or more optimization measurements are compared with the reference measurement; and an optimal bandwidth for the measurement application is selected based on the comparison.
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公开(公告)号：US20200284578A1
公开(公告)日：2020-09-10
申请号：US16882977
申请日：2020-05-26
发明人： Alok VERMA , Hugo Augustinus Joseph CRAMER , Thomas THEEUWES , Anagnostis TSIATMAS , Bert VERSTRAETEN
IPC分类号： G01B11/27 , G01N21/55 , G03F7/20 , G06F30/398
摘要： A substrate having a plurality of features for use in measuring a parameter of a device manufacturing process and associated methods and apparatus. The measurement is by illumination of the features with measurement radiation from an optical apparatus and detecting a signal arising from interaction between the measurement radiation and the features. The plurality of features include first features distributed in a periodic fashion at a first pitch, and second features distributed in a periodic fashion at a second pitch, wherein the first pitch and second pitch are such that a combined pitch of the first and second features is constant irrespective of the presence of pitch walk in the plurality of features.
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公开(公告)号：US20170256465A1
公开(公告)日：2017-09-07
申请号：US15445465
申请日：2017-02-28
发明人： Adriaan Johan VAN LEEST , Anagnostis TSIATMAS , Paul Christiaan HINNEN , Elliott Gerard McNAMARA , Alok VERMA , Thomas THEEUWES , Hugo Augustinus Joseph CRAMER
IPC分类号： H01L21/66 , G01N21/88 , G01N21/95 , H01L21/308
CPC分类号： H01L22/12 , G01N21/9501 , G03F7/70633 , G03F7/70683 , G03F9/7003
摘要： A method of determining overlay of a patterning process, the method including: illuminating a substrate with a radiation beam such that a beam spot on the substrate is filled with one or more physical instances of a unit cell, the unit cell having geometric symmetry at a nominal value of overlay; detecting primarily zeroth order radiation redirected by the one or more physical instances of the unit cell using a detector; and determining, by a hardware computer system, a non-nominal value of overlay of the unit cell from values of an optical characteristic of the detected radiation.
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公开(公告)号：US20170255738A1
公开(公告)日：2017-09-07
申请号：US15445536
申请日：2017-02-28
发明人： Adriaan Johan VAN LEEST , Anagnostis TSIATMAS , Paul Christiaan HINNEN , Elliott Gerard McNAMARA , Alok VERMA , Thomas THEEUWES , Hugo Augustinus Joseph CRAMER
IPC分类号： G06F17/50 , H01L21/308 , H01L21/66
CPC分类号： H01L22/12 , G01N21/9501 , G03F7/70633 , G03F7/70683 , G03F9/7003
摘要： A method of configuring a parameter determination process, the method including: obtaining a mathematical model of a structure, the mathematical model configured to predict an optical response when illuminating the structure with a radiation beam and the structure having geometric symmetry at a nominal physical configuration; using, by a hardware computer system, the mathematical model to simulate a perturbation in the physical configuration of the structure of a certain amount to determine a corresponding change of the optical response in each of a plurality of pixels to obtain a plurality of pixel sensitivities; and based on the pixel sensitivities, determining a plurality of weights for combination with measured pixel optical characteristic values of the structure on a substrate to yield a value of a parameter associated with change in the physical configuration, each weight corresponding to a pixel.
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公开(公告)号：US20240160151A1
公开(公告)日：2024-05-16
申请号：US18280459
申请日：2022-03-04
发明人： Willem Marie Julia Marcel COENE , Vasco Tomas TENNER , Hugo Augustinus Joseph CRAMER , Arie Jeffrrey DEN BOEF , Wouter Dick KOEK , Sergei SOKOLOV , Jeroen Johan Maarten VAN DE WIJDEVEN , Alexander Kenneth RAUB
CPC分类号： G03H1/0486 , G01N21/9501 , G02B21/10 , G02B21/365 , G03H1/0866 , G03H2001/0038 , G03H2001/0044 , G03H2001/005 , G03H2001/0232 , G03H2001/0445 , G03H2001/0473 , G03H2210/62
摘要： A method of correcting a holographic image, a processing device, a dark field digital holographic microscope, a metrology apparatus and an inspection apparatus. The method includes obtaining a holographic image; determining at least one attenuation function due to motion blur from the holographic image; and correcting the holographic image, or a portion thereof, using the at least one attenuation function.
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