公开(公告)号：US20150185625A1

公开(公告)日：2015-07-02

申请号：US14577966

申请日：2014-12-19

Applicant: ASML NETHERLANDS B.V.

Inventor： Guangqing CHEN ,  Wei LIU ,  Maurits VAN DER SCHAAR

IPC: G03F7/20 ,  G01B11/00 ,  G01B11/30

Abstract: A method of metrology target design is described. The method includes determining a sensitivity of a parameter of a metrology target design to a perturbation of a process parameter for forming, or measuring the formation of, the metrology target, and determining a robustness of the metrology target design based on the sum of the sensitivity multiplied by the perturbation of at least one of the process parameters.

Abstract translation: 描述了一种计量目标设计方法。 该方法包括将测量目标设计的参数的灵敏度确定为用于形成或测量计量目标的形成的过程参数的扰动，以及基于灵敏度之和确定度量目标设计的鲁棒性 乘以至少一个过程参数的扰动。