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公开(公告)号：US20150185625A1
公开(公告)日：2015-07-02
申请号：US14577966
申请日：2014-12-19
Applicant: ASML NETHERLANDS B.V.
Inventor： Guangqing CHEN , Wei LIU , Maurits VAN DER SCHAAR
Abstract: A method of metrology target design is described. The method includes determining a sensitivity of a parameter of a metrology target design to a perturbation of a process parameter for forming, or measuring the formation of, the metrology target, and determining a robustness of the metrology target design based on the sum of the sensitivity multiplied by the perturbation of at least one of the process parameters.
Abstract translation: 描述了一种计量目标设计方法。 该方法包括将测量目标设计的参数的灵敏度确定为用于形成或测量计量目标的形成的过程参数的扰动，以及基于灵敏度之和确定度量目标设计的鲁棒性 乘以至少一个过程参数的扰动。
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公开(公告)号：US20180268093A1
公开(公告)日：2018-09-20
申请号：US15982933
申请日：2018-05-17
Applicant: ASML Netherlands B.V.
Inventor： Guangqing CHEN , Shufeng Bai , Eric Richard Kent , Yen-Wen Lu , Paul Anthony Tuffy , Jen-Shiang Wang , Youping Zhang , Gertjan Zwartjes , Jan Wouter Bijlsma
CPC classification number: G06F17/5009 , G03F7/705 , G03F7/70633 , G03F7/70683 , G06F17/12 , G06F17/14 , G06F2217/12 , G06F2217/14
Abstract: Methods and systems for automatically generating robust metrology targets which can accommodate a variety of lithography processes and process perturbations. Individual steps of an overall lithography process are modeled into a single process sequence to simulate the physical substrate processing. That process sequence drives the creation of a three-dimensional device geometry as a whole, rather than “building” the device geometry element-by-element.
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公开(公告)号：US20160140267A1
公开(公告)日：2016-05-19
申请号：US14941347
申请日：2015-11-13
Applicant: ASML NETHERLANDS B.V.
Inventor： Guangqing CHEN , Shufeng BAI , Eric Richard KENT , Yen-Wen LU , Paul Anthony TUFFY , Jen-Shiang WANG , Youping ZHANG , Gertjan ZWARTJES , Jan Wouter BIJLSMA
CPC classification number: G06F17/5009 , G03F7/705 , G03F7/70633 , G03F7/70683 , G06F17/12 , G06F17/14
Abstract: Methods and systems for automatically generating robust metrology targets which can accommodate a variety of lithography processes and process perturbations. Individual steps of an overall lithography process are modeled into a single process sequence to simulate the physical substrate processing. That process sequence drives the creation of a three-dimensional device geometry as a whole, rather than “building” the device geometry element-by-element.
Abstract translation: 用于自动生成稳健计量目标的方法和系统，可以适应各种光刻过程和过程扰动。 整个光刻过程的各个步骤被建模成单个过程序列以模拟物理衬底处理。 该过程顺序驱动了整体的三维设备几何的创建，而不是逐个“构建”设备几何。
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Patent Agency Ranking
公开(公告)号：US20150186582A1
公开(公告)日：2015-07-02
申请号：US14577901
申请日：2014-12-19
Applicant: ASML NETHERLANDS B.V.
Inventor： Guangqing CHEN , Justin GHAN , David Harold WHYSONG
IPC: G06F17/50
CPC classification number: G06F17/5068 , G03F7/70625 , G03F7/70633 , G03F7/70641 , G03F7/70683 , G03F9/7046 , G03F9/7076
Abstract: A method of metrology target design is described. The method includes providing a range or a plurality of values for design parameter of a metrology target and by a processor, selecting, by solving for and/or sampling within the range or the plurality of values for the design parameters, a plurality of metrology target designs having one or more design parameters meeting a constraint for a design parameter of the metrology target.
Abstract translation: 描述了一种计量目标设计方法。 该方法包括提供测量目标的设计参数的范围或多个值，并且由处理器通过在设计参数的范围或多个值内求解和/或采样来选择多个度量目标 具有满足度量目标的设计参数的约束的一个或多个设计参数的设计。
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公开(公告)号：US20250044710A1
公开(公告)日：2025-02-06
申请号：US18714547
申请日：2022-12-13
Applicant: ASML NETHERLANDS B.V.
Inventor： Jiyou FU , Jing SU , Chenxi LIN , Jiao LIANG , Guangqing CHEN , Yi ZOU
Abstract: A method of image template matching for multiple process layers of, for example, semiconductor substrate with an adaptive weight map is described. An image template is provided with a weight map, which is adaptively updated based during template matching based on the position of the image template on the image. A method of template matching a grouped pattern or artifacts in a composed template is described, wherein the pattern comprises deemphasized areas weighted less than the image templates. A method of generating an image template based on a synthetic image is described. The synthetic image can be generated based on process and image modeling. A method of selecting a grouped pattern or artifacts and generating a composed template is described. A method of per layer image template matching is described.
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公开(公告)号：US20180046737A1
公开(公告)日：2018-02-15
申请号：US15559759
申请日：2016-03-24
Applicant: ASML Netherlands B.V.
Inventor： Lotte Marloes WILLEMS , Kaustuve BHATTACHARYYA , Panagiotis Peter BINTEVINOS , Guangqing CHEN , Martin EBERT , Pieter Jacob Mathias Hendrik KNELISSEN , Stephen MORGAN , Maurits VAN DER SCHAAR , Leonardus Hericus Marie VERSTAPPEN , Jen-Shiang WANG , Peter Hanzen WARDENIER
CPC classification number: G06F17/5009 , G03F7/705 , G03F7/70625 , G03F7/70633 , G03F7/70683 , G03F9/7046 , G06F2217/16
Abstract: A method including performing a simulation to evaluate a plurality of metrology targets and/or a plurality of metrology recipes used to measure a metrology target, identifying one or more metrology targets and/or metrology recipes from the evaluated plurality of metrology targets and/or metrology recipes, receiving measurement data of the one or more identified metrology targets and/or metrology recipes, and using the measurement data to tune a metrology target parameter or metrology recipe parameter.
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公开(公告)号：US20160252820A1
公开(公告)日：2016-09-01
申请号：US15154456
申请日：2016-05-13
Applicant: ASML NETHERLANDS B.V.
Inventor： Guangqing CHEN , Eric Richard KENT , Jen-Shiang WANG , Omer Abubaker Omer ADAM
CPC classification number: G03F7/706 , G03F7/70625 , G03F7/70633 , G03F7/70641 , G03F7/70683 , G06F17/5009 , G06F17/5068 , G06F2217/12 , G06F2217/14
Abstract: A method of metrology target design is described. The method includes determining a sensitivity of a parameter for a metrology target design to an optical aberration, determining the parameter for a product design exposed using an optical system of a lithographic apparatus, and determining an impact on the parameter of the metrology target design based on the parameter for the product design and the product of the sensitivity and one or more of the respective aberrations of the optical system.
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公开(公告)号：US20150185626A1
公开(公告)日：2015-07-02
申请号：US14578036
申请日：2014-12-19
Applicant: ASML NETHERLANDS B.V.
Inventor： Guangqing CHEN , Jen-Shiang Wang , Shufeng Bai
IPC: G03F7/20
CPC classification number: G03F7/70633 , G03F7/705 , G03F7/70625 , G03F7/70641 , G03F7/70683
Abstract: A system to, and a method to, select a metrology target for use on a substrate including performing a lithographic simulation for a plurality of points on a process window region for each proposed target, identifying a catastrophic error for any of the plurality of points for each proposed target, eliminating each target having a catastrophic error at any of the plurality of points, performing a metrology simulation to determine a parameter over the process window for each target not having a catastrophic error at any of the plurality of points, and using the one or more resulting determined simulated parameters to evaluate target quality.
Abstract translation: 一种用于选择在基板上使用的测量目标的系统和方法，包括对于每个所提出的目标执行对于处理窗口区域上的多个点的光刻模拟，识别多个点中的任一点的灾难性误差 每个所提出的目标，消除每个目标在多个点中的任一点具有灾难性错误，执行度量仿真以确定在多个点中的任一点上没有灾难性错误的每个目标的处理窗口上的参数，并且使用 一个或多个产生的确定的模拟参数来评估目标质量。
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