公开(公告)号：US20240272543A1

公开(公告)日：2024-08-15

申请号：US18565889

申请日：2022-05-27

Applicant: ASML NETHERLANDS B.V.

Inventor： Wen LYU ,  Mir Farrokh SHAYEGAN SALEK ,  Xiaobo XIE ,  Jen-Shiang WANG

IPC: G03F1/36 ,  G03F7/00

CPC classification number: G03F1/36 ,  G03F7/70441 ,  G03F7/705

Abstract: A methods and systems for determining rounded contours of target contours or other lithography related contour for mask design. The method includes converting a contour representation to (i) a first set of contour point locations in a first dimension (e.g., x) and (ii) a second set of contour point locations in a second dimension (e.g., y). A signal function is determined based on the first and second sets of contour point locations, the signal function indicative of different segments of the contour representation. The first set of contour point locations is updated based on a first filter function and the signal function, and the second set of contour point locations is updated based on a second filter function and the signal function. Based on the updated contour point locations, a rounded contour of the contour representation is generated.