Patent search ap:("ASML NETHERLANDS B.V.") AND inv:"Yuri Johannes Gabriel Van De Vijver" Page 1

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发明授权
Lithographic apparatus, a projection system and a device manufacturing method 有权

公开(公告)号：US10310394B2

公开(公告)日：2019-06-04

申请号：US15289118

申请日：2016-10-07

Applicant: ASML NETHERLANDS B.V.

Inventor： Yuri Johannes Gabriel Van De Vijver , Johannes Hubertus Josephina Moors , Wendelin Johanna Maria Versteeg , Peter Gerardus Jonkers

IPC: G03F7/20

Abstract: A lithographic apparatus is disclosed that includes a projection system configured to project a patterned radiation beam onto a target portion of a substrate, a vacuum chamber through which the patterned beam of radiation is projected during use, and a purge system configured to provide a purge gas flow in the chamber.

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