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公开(公告)号：US12259546B2
公开(公告)日：2025-03-25
申请号：US17634023
申请日：2020-08-05
Applicant: ASML NETHERLANDS B.V. , IMEC v.z.w.
Inventor： Alexandre Halbach , Nitesh Pandey , Sebastianus Adrianus Goorden , Veronique Rochus , Luc Roger Simonne Haspeslagh , Guilherme Brondani Torri
Abstract: A micromirror array includes a substrate, a plurality of mirrors for reflecting incident radiation, and for each mirror of the plurality of mirrors, a respective post connecting the substrate to the respective mirror. The micromirror array further includes, for each mirror of the plurality of mirrors, one or more electrostatic actuators connected to the substrate for applying force to the respective post to displace the respective post relative to the substrate, thereby displacing the respective mirror. Also disclosed is a method of forming such a micromirror array. The micromirror array may be used in a programmable illuminator. The programmable illuminator may be used in a lithographic apparatus and/or in an inspection apparatus.
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公开(公告)号：US12276784B2
公开(公告)日：2025-04-15
申请号：US17635907
申请日：2020-08-05
Applicant: ASML Netherlands B.V. , IMEC v.z.w.
Inventor： Luc Roger Simonne Haspeslagh , Veronique Rochus , Guilherme Brondani Torri , Nitesh Pandey , Sebastianus Adrianus Goorden
Abstract: A micromirror array comprises a substrate, a plurality of minors for reflecting incident light and, for each mirror (20) of the plurality of minors, at least one piezoelectric actuator (21) for displacing the minor, wherein the at least one piezoelectric actuator is connected to the substrate. The micromirror array further comprises one or more pillars (24) connecting the minor to the at least one piezoelectric actuator. Also disclosed is a method of forming such a micromirror array. The micromirror array may be used in a programmable illuminator. The programmable illuminator may be used in a lithographic apparatus and/or in an inspection apparatus.
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