-
公开(公告)号：US12259546B2
公开(公告)日：2025-03-25
申请号：US17634023
申请日：2020-08-05
Applicant: ASML NETHERLANDS B.V. , IMEC v.z.w.
Inventor： Alexandre Halbach , Nitesh Pandey , Sebastianus Adrianus Goorden , Veronique Rochus , Luc Roger Simonne Haspeslagh , Guilherme Brondani Torri
Abstract: A micromirror array includes a substrate, a plurality of mirrors for reflecting incident radiation, and for each mirror of the plurality of mirrors, a respective post connecting the substrate to the respective mirror. The micromirror array further includes, for each mirror of the plurality of mirrors, one or more electrostatic actuators connected to the substrate for applying force to the respective post to displace the respective post relative to the substrate, thereby displacing the respective mirror. Also disclosed is a method of forming such a micromirror array. The micromirror array may be used in a programmable illuminator. The programmable illuminator may be used in a lithographic apparatus and/or in an inspection apparatus.
-
公开(公告)号：US12276784B2
公开(公告)日：2025-04-15
申请号：US17635907
申请日：2020-08-05
Applicant: ASML Netherlands B.V. , IMEC v.z.w.
Inventor： Luc Roger Simonne Haspeslagh , Veronique Rochus , Guilherme Brondani Torri , Nitesh Pandey , Sebastianus Adrianus Goorden
Abstract: A micromirror array comprises a substrate, a plurality of minors for reflecting incident light and, for each mirror (20) of the plurality of minors, at least one piezoelectric actuator (21) for displacing the minor, wherein the at least one piezoelectric actuator is connected to the substrate. The micromirror array further comprises one or more pillars (24) connecting the minor to the at least one piezoelectric actuator. Also disclosed is a method of forming such a micromirror array. The micromirror array may be used in a programmable illuminator. The programmable illuminator may be used in a lithographic apparatus and/or in an inspection apparatus.
-
公开(公告)号：US11022902B2
公开(公告)日：2021-06-01
申请号：US16623647
申请日：2018-05-14
Applicant: ASML Netherlands B.V.
Inventor： Arie Jeffrey Den Boef , Patricius Aloysius Jacobus Tinnemans , Haico Victor Kok , William Peter Van Drent , Sebastianus Adrianus Goorden
Abstract: The invention relates to a sensor comprising: a radiation source to emit radiation having a coherence length towards a sensor target; and a polarizing beam splitter to split radiation diffracted by the sensor target into radiation with a first polarization state and radiation with a second polarization state, wherein the first polarization state is orthogonal to the second polarization state, and wherein the sensor is configured such that after passing the polarizing beam splitter radiation with the first polarization state has an optical path difference relative to radiation with the second polarization state that is larger than the coherence length.
-
公开(公告)号：US20210124276A1
公开(公告)日：2021-04-29
申请号：US17254601
申请日：2019-06-05
Applicant: ASML Netherlands B.V.
Inventor： Sebastianus Adrianus Goorden , Simon Reinald Huisman , Duygu Akbulut , Alessandro Polo , Johannes Antonius Gerardus Akkermans , Arie Jeffrey Den Boef
IPC: G03F9/00
Abstract: The invention provides a position sensor (300) which comprises an optical system (305, 306) configured to provide measurement radiation (304) to a substrate (307). The optical system is arranged to receive at least a portion of radiation (309) diffracted by a mark (308) provided on the substrate. A processor (313) is applied to derive at least one position-sensitive signal (312) from the received radiation. The measurement radiation comprises at least a first and a second selected radiation wavelength. The selection of the at least first and second radiation wavelengths is based on a position error swing-curve model.
-
公开(公告)号：US10788766B2
公开(公告)日：2020-09-29
申请号：US16611500
申请日：2018-03-06
Applicant: ASML Netherlands B.V.
Inventor： Sebastianus Adrianus Goorden , Simon Reinald Huisman , Duygu Akbulut , Alessandro Polo , Simon Gijsbert Josephus Mathijssen
Abstract: Disclosed is a metrology sensor apparatus and associated method. The metrology sensor apparatus comprises an illumination system operable to illuminate a metrology mark on a substrate with illumination radiation having a first polarization state and an optical collection system configured to collect scattered radiation, following scattering of the illumination radiation by the metrology mark. The metrology mark comprises a main structure and changes, relative to the first polarization state, at least one of a polarization state of a first portion of the scattered radiation predominately resultant from scattering by the main structure and a polarization state of a second portion of radiation predominately resultant from scattering by one or more features other than the main structure, such that the polarization state of the first portion of the scattered radiation is different to the polarization state of the second portion of the scattered radiation. The metrology sensor apparatus further comprises an optical filtering system which filters out the second portion of the scattered radiation based on its polarization state.
-
Patent Agency Ranking
公开(公告)号：US10788765B2
公开(公告)日：2020-09-29
申请号：US16478068
申请日：2018-01-10
Applicant: ASML NETHERLANDS B.V.
Inventor： Stefan Michiel Witte , Alessandro Antoncecchi , Stephen Edward , Hao Zhang , Paulus Clemens Maria Planken , Kjeld Sijbrand Eduard Eikema , Sebastianus Adrianus Goorden , Simon Reinald Huisman , Irwan Dani Setija
Abstract: As increasing numbers of layers, using increasing numbers of specific materials, are deposited on substrates, it becomes increasingly difficult to detect alignment marks accurately for, for example, applying a desired pattern onto a substrate using a lithographic apparatus, in part due to one or more of the materials used in one or more of the layers being wholly or partially opaque to the radiation used to detect alignment marks. In a first step, the substrate is illuminated with excitation radiation. In a second step, at least one effect associated with a reflected material effect scattered by a buried structure is measured. The effect may, for example, include a physical displacement of the surface of the substrate. In a third step, at least one characteristic of the structure based on the measured effect is derived.
-
公开(公告)号：US10303064B2
公开(公告)日：2019-05-28
申请号：US15589958
申请日：2017-05-08
Applicant: ASML Netherlands B.V.
Inventor： Sebastianus Adrianus Goorden , Teunis Willem Tukker , Johannes Matheus Marie De Wit , Jonas Mertes , Gerbrand Van Der Zouw
IPC: G03B27/42 , G03F7/20 , G03F7/16 , G03F7/38 , G03F7/26 , G01B11/06 , G01B11/27 , G01N21/88 , G01N21/47 , G02B27/09
Abstract: Disclosed are an optical system for conditioning a beam of radiation, and an illumination system and metrology apparatus comprising such an optical system. The optical system comprises one or more optical mixing elements in an optical system. The optical system defines at least a first optical mixing stage, at least a second optical mixing stage, and at least one transformation stage, configured such that radiation entering the second optical mixing stage includes a transformed version of radiation exiting the first optical mixing stage. The first and second optical mixing stages can be provided using separate optical mixing elements, or by multiple passes through the same optical mixing element. The transformation stage can be a Fourier transformation stage. Both spatial distribution and angular distribution of illumination can be homogenized as desired.
-
公开(公告)号：US12287591B2
公开(公告)日：2025-04-29
申请号：US18269191
申请日：2021-12-02
Applicant: ASML Netherlands B.V. , ASML Holding N.V.
Inventor： Arjan Johannes Anton Beukman , Sebastianus Adrianus Goorden , Stephen Roux , Sergei Sokolov , Filippo Alpeggiani
Abstract: A method includes irradiating a target structure with sequential illumination shots, directing scattered beams from the target structure towards an imaging detector, generating a detection signal using the imaging detector, and determining a property of the target structure based on at least the detection signal. An integration time for each illumination shot of the sequential illumination shots is selected so to reduce a low frequency error.
-
公开(公告)号：US12287470B2
公开(公告)日：2025-04-29
申请号：US18441710
申请日：2024-02-14
Applicant: ASML NETHERLANDS B.V.
Inventor： Sebastianus Adrianus Goorden
Abstract: A dark field metrology device includes an objective lens arrangement and a zeroth order block to block zeroth order radiation. The objective lens arrangement directs illumination onto a specimen to be measured and collects scattered radiation from the specimen, the scattered radiation including zeroth order radiation and higher order diffracted radiation. The dark field metrology device is operable to perform an illumination scan to scan illumination over at least two different subsets of the maximum range of illumination angles; and simultaneously perform a detection scan which scans the zeroth order block and/or the scattered radiation with respect to each other over a corresponding subset of the maximum range of detection angles during at least part of the illumination scan.
-
公开(公告)号：US11940608B2
公开(公告)日：2024-03-26
申请号：US17608038
申请日：2020-04-02
Applicant: ASML NETHERLANDS B.V.
Inventor： Sebastianus Adrianus Goorden
CPC classification number: G02B21/0016 , G01N21/9501 , G02B21/002 , G02B21/0036 , G02B21/02 , G02B21/10 , G03F7/70625 , G03F7/70633 , G03F7/706849 , G03F7/706851 , G01N21/95623
Abstract: A dark field metrology device includes an objective lens arrangement and a zeroth order block to block zeroth order radiation. The objective lens arrangement directs illumination onto a specimen to be measured and collects scattered radiation from the specimen, the scattered radiation including zeroth order radiation and higher order diffracted radiation. The dark field metrology device is operable to perform an illumination scan to scan illumination over at least two different subsets of the maximum range of illumination angles; and simultaneously perform a detection scan which scans the zeroth order block and/or the scattered radiation with respect to each other over a corresponding subset of the maximum range of detection angles during at least part of the illumination scan.
-
-
-
-
-
-
-
-
-
Search Results
32
records
(took 0.025 seconds)
