公开(公告)号：US20240412067A1

公开(公告)日：2024-12-12

申请号：US18808844

申请日：2024-08-19

Applicant: ASML Netherlands B. V.

Inventor： Lorenzo TRIPODI ,  Patrick WARNAAR ,  Grzegorz GRZELA ,  Mohammadreza HAJIAHMADI ,  Farzad FARHADZADEH ,  Patricius Aloysius Jacobus TINNEMANS ,  Scott Anderson MIDDLEBROOKS ,  Adrianus Cornelis Matheus KOOPMAN ,  Frank STAALS ,  Brennan PETERSON ,  Anton Bernhard VAN OOSTEN

IPC: G06N3/08 ,  G01B11/02 ,  G01N21/55 ,  G06T7/00

Abstract: Disclosed is a method of determining a characteristic of interest relating to a structure on a substrate formed by a lithographic process, the method comprising: obtaining an input image of the structure; and using a trained neural network to determine the characteristic of interest from said input image. Also disclosed is a reticle comprising a target forming feature comprising more than two sub-features each having different sensitivities to a characteristic of interest when imaged onto a substrate to form a corresponding target structure on said substrate. Related methods and apparatuses are also described.