公开(公告)号：US11101099B2

公开(公告)日：2021-08-24

申请号：US16638124

申请日：2018-06-21

Applicant: ASML Netherlands B.V.

Inventor： Alexander Hendrik Vincent Van Veen ,  Derk Ferdinand Walvoort

IPC: H01J37/04 ,  H01J37/317

Abstract: The invention relates to an exposure apparatus and a method for projecting a charged particle beam onto a target. The exposure apparatus comprises a charged particle optical arrangement comprising a charged particle source for generating a charged particle beam and a charged particle blocking element and/or a current limiting element for blocking at least a part of a charged particle beam from a charged particle source. The charged particle blocking element and the current limiting element comprise a substantially flat substrate provided with an absorbing layer comprising Boron, Carbon or Beryllium. The substrate further preferably comprises one or more apertures for transmitting charged particles. The absorbing layer is arranged spaced apart from the at least one aperture.