公开(公告)号：US11094426B2

公开(公告)日：2021-08-17

申请号：US16796849

申请日：2020-02-20

申请人： ASML Netherlands B.V.

发明人： Alexander Hendrik Vincent Van Veen ,  Willem Henk Urbanus ,  Marco Jan-Jaco Wieland

IPC分类号： H01J37/30 ,  G21K5/04 ,  G21K1/02 ,  H01J37/317 ,  H01J37/16 ,  H01J37/12

摘要： The invention relates to charged particle beam generator comprising a charged particle source for generating a charged particle beam, a collimator system comprising a collimator structure with a plurality of collimator electrodes for collimating the charged particle beam, a beam source vacuum chamber comprising the charged particle source, and a generator vacuum chamber comprising the collimator structure and the beam source vacuum chamber within a vacuum, wherein the collimator system is positioned outside the beam source vacuum chamber. Each of the beam source vacuum chamber and the generator vacuum chamber may be provided with a vacuum pump.

公开(公告)号：US11348756B2

公开(公告)日：2022-05-31

申请号：US15985763

申请日：2018-05-22

申请人： ASML Netherlands B.V.

发明人： Alexander Hendrik Vincent Van Veen ,  Willem Henk Urbanus ,  Marco Jan-Jaco Wieland

IPC分类号： H01J37/153 ,  H01J37/12 ,  H01J37/09 ,  H01J37/065 ,  H01J37/317 ,  H01J37/02

摘要： A lens element of a charged particle system comprises an electrode having a central opening. The lens element is configured for functionally cooperating with an aperture array that is located directly adjacent said electrode, wherein the aperture array is configured for blocking part of a charged particle beam passing through the central opening of said electrode. The electrode is configured to operate at a first electric potential and the aperture array is configured to operate at a second electric potential different from the first electric potential. The electrode and the aperture array together form an aberration correcting lens.

公开(公告)号：US11101099B2

公开(公告)日：2021-08-24

申请号：US16638124

申请日：2018-06-21

申请人： ASML Netherlands B.V.

发明人： Alexander Hendrik Vincent Van Veen ,  Derk Ferdinand Walvoort

IPC分类号： H01J37/04 ,  H01J37/317

摘要： The invention relates to an exposure apparatus and a method for projecting a charged particle beam onto a target. The exposure apparatus comprises a charged particle optical arrangement comprising a charged particle source for generating a charged particle beam and a charged particle blocking element and/or a current limiting element for blocking at least a part of a charged particle beam from a charged particle source. The charged particle blocking element and the current limiting element comprise a substantially flat substrate provided with an absorbing layer comprising Boron, Carbon or Beryllium. The substrate further preferably comprises one or more apertures for transmitting charged particles. The absorbing layer is arranged spaced apart from the at least one aperture.

公开(公告)号：US10586625B2

公开(公告)日：2020-03-10

申请号：US15493159

申请日：2017-04-21

申请人： ASML Netherlands B.V.

发明人： Alexander Hendrik Vincent Van Veen ,  Willem Henk Urbanus ,  Marco Jan-Jaco Wieland

IPC分类号： H01J37/153 ,  G21K5/04 ,  H01J37/30 ,  G21K1/02 ,  H01J37/317 ,  H01J37/16 ,  H01J37/12

摘要： The invention relates to charged particle beam generator comprising a charged particle source for generating a charged particle beam, a collimator system comprising a collimator structure with a plurality of collimator electrodes for collimating the charged particle beam, a beam source vacuum chamber comprising the charged particle source, and a generator vacuum chamber comprising the collimator structure and the beam source vacuum chamber within a vacuum, wherein the collimator system is positioned outside the beam source vacuum chamber. Each of the beam source vacuum chamber and the generator vacuum chamber may be provided with a vacuum pump.