公开(公告)号：USRE49732E1

公开(公告)日：2023-11-21

申请号：US16427228

申请日：2019-05-30

Applicant: ASML Netherlands B.V.

Inventor： Paul IJmert Scheffers ,  Jan Andries Meijer ,  Erwin Slot ,  Vincent Sylvester Kuiper ,  Niels Vergeer

IPC: H01J37/09 ,  H01J37/16 ,  H01J37/304 ,  B82Y40/00 ,  G03F7/00 ,  B82Y10/00

CPC classification number: H01J37/3045 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/707 ,  H01J2237/1502

Abstract: A multi-beamlet charged particle beamlet lithography system for transferring a pattern to a surface of a substrate. The system comprises a projection system (311) for projecting a plurality of charged particle beamlets (7) onto the surface of the substrate; a chuck (313) moveable with respect to the projection system; a beamlet measurement sensor (i.a. i.e., 505, 511) for determining one or more characteristics of one or more of the charged particle beamlets, the beamlet measurement sensor having a surface (501) for receiving one or more of the charged particle beamlets; and a position mark measurement system for measuring a position of a position mark (610, 620, 635), the position mark measurement system comprising an alignment sensor (361, 362). The chuck comprises a substrate support portion for supporting the substrate, a beamlet measurement sensor portion (460) for accommodating the surface of the beamlet measurement sensor, and a position mark portion (470) for accommodating the position mark.