公开(公告)号：US20230205097A1

公开(公告)日：2023-06-29

申请号：US18000148

申请日：2021-05-10

Applicant: ASML Netherlands B.V.

Inventor： Mattia MARELLI ,  Mohammadreza HAJIAHMADI

IPC: G03F7/20 ,  G03F9/00

CPC classification number: G03F7/70641 ,  G03F9/7076 ,  G03F9/7026

Abstract: Disclosed is a method for determining a focus parameter value used to expose at least one structure on a substrate. The method comprises obtaining measurement data relating to a measurement of said at least one structure, wherein the at least one structure comprises a single periodic structure per measurement location and decomposing said measurement data into component data comprising one or more components of said measurement data. At least one of said components is processed to extract processed component data having a reduced dependence on non-focus related effects and a value for the focus parameter is determined from said processed component data. Associated apparatuses and patterning devices are also disclosed.