公开(公告)号：US20230377831A1

公开(公告)日：2023-11-23

申请号：US18027903

申请日：2021-09-02

Applicant: ASML Netherlands B.V.

Inventor： Oleg KRUPIN ,  Weiming REN ,  Xuerang HU ,  Xuedong LIU

IPC: H01J37/147 ,  H01J37/244 ,  H01J37/21

CPC classification number: H01J37/1472 ,  H01J37/244 ,  H01J37/21 ,  H01J37/28

Abstract: A method of operating a secondary imaging system of a charged particle beam apparatus may include using an anti-scanning mode. Excitation of a component of the secondary imaging system may be adjusted synchronously with a primary scanning deflection unit. Together with an anti-scanning deflection unit performing anti-scanning, a component of the secondary imaging system, such as a lens, may be adjusted in step. As scanning and anti-scanning is performed, excitation parameters of the component may also be constantly updated.

公开(公告)号：US20240079204A1

公开(公告)日：2024-03-07

申请号：US18269532

申请日：2021-12-08

Applicant: ASML Netherlands B.V.

Inventor： Yongxin WANG ,  Oleg KRUPIN ,  Weiming REN ,  Xuerang HU ,  Xuedong LIU

IPC: H01J37/244 ,  H01J37/28

CPC classification number: H01J37/244 ,  H01J37/28

Abstract: A method of detecting charged particles may include detecting beam intensity as a primary charged particle beam moves along a first direction; acquiring a secondary beam spot projection pattern as the primary charged particle beam moves along a second direction; and determining a parameter of a secondary beam spot based on the acquired secondary beam spot projection pattern. A method of compensating for beam spot changes on a detector may include acquiring a beam spot projection pattern on the detector, determining a change of the beam spot projection pattern, and adjusting a parameter of a detector cell of the detector based on the change. Another method may be provided for forming virtual apertures with respect to detector cells of a detector.