公开(公告)号：US20240177962A1

公开(公告)日：2024-05-30

申请号：US18072451

申请日：2022-11-30

申请人： APPLIED MATERIALS ISRAEL LTD.

发明人： Ofer Dudovitch ,  Ido Ben Noon ,  Efi Zertser

IPC分类号： H01J37/20 ,  G01N23/2251 ,  H01J37/18 ,  H01J37/21 ,  H01J37/28

CPC分类号： H01J37/20 ,  G01N23/2251 ,  H01J37/18 ,  H01J37/21 ,  H01J37/28 ,  H01J2237/24578

摘要： A system for processing a sample comprising: a vacuum chamber having a window formed along one of its walls; a sample support configured to hold a sample within the vacuum chamber during a sample processing operation and move the substrate within the vacuum chamber along the X, Y and Z axes; a charged particle beam column configured to direct a charged particle beam into the vacuum chamber and focus the beam to collide with a region of interest on the sample; an optical distance measurement device configured to generate and direct electromagnetic radiation into the vacuum chamber through the window, detect photons from the electromagnetic radiation reflected off the sample, and determine a working distance between the sample and charged particle column based on the generated electromagnetic radiation and the detected photons; and one or more mirrors disposed within the vacuum chamber and positioned to direct the electromagnetic radiation generated by the optical distance measurement system to a measured location on the sample that is in close proximity to the region of interest, the one or more mirrors comprising at least one mirror positioned directly under a portion of the charged particle column.

公开(公告)号：US20240071715A1

公开(公告)日：2024-02-29

申请号：US17893836

申请日：2022-08-23

申请人： APPLIED MATERIALS ISRAEL LTD.

发明人： Sissi Lachmi ,  Hagay Famini

IPC分类号： H01J37/21 ,  H01J37/147 ,  H01J37/28

CPC分类号： H01J37/21 ,  H01J37/1478 ,  H01J37/28 ,  H01J2237/216

摘要： A charged particle evaluation system that may include a column that includes an opening; an illumination unit that is configured to scan an area of a sample with an electron beam that passes through the opening; and an optical auto-focus unit that is configured to (i) illuminate the sample with an optical beam that is proximate to the electron beam, during the scan of the area with the electron beam; (ii) receive a reflected optical beam from the sample, (iii) determine a focus status of the electron beam, and (iv) participate in a compensating of an electron beam misfocus.

公开(公告)号：US20230411111A1

公开(公告)日：2023-12-21

申请号：US18142119

申请日：2023-05-02

申请人： Hitachi High-Tech Corporation

发明人： Tetsuro KADOWAKI ,  Takeyoshi OHASHI ,  Takuma YAMAMOTO

IPC分类号： H01J37/21 ,  H01J37/147 ,  H01J37/28

CPC分类号： H01J37/21 ,  H01J37/1478 ,  H01J2237/24578 ,  H01J2237/216 ,  H01J2237/24585 ,  H01J37/28

摘要： The present disclosure makes it possible to shorten the time required for measurement of a sample and to measure the sample with high throughput. A charged particle beam apparatus includes a storage device that stores a correction value table corresponding to a recipe and a computer system that executes measurement on a plurality of measurement points of a sample according to a measurement order determined in the recipe. The computer system stores, when executing the recipe on a first sample, an adjustment result of one or more imaging conditions in the correction value table at each of a plurality of measurement points of the first sample, and adjusts, when executing the recipe on a second sample different from the first sample, the imaging condition based on the adjustment result of the one or more imaging conditions stored in the correction value table at each of the plurality of measurement points.

公开(公告)号：US20230360878A1

公开(公告)日：2023-11-09

申请号：US18313995

申请日：2023-05-08

申请人： IMS Nanofabrication GmbH

发明人： Dietmar Puchberger ,  Johannes Leitner ,  Patrick Mayrhofer ,  Christoph Spengler ,  Elmar Platzgummer

IPC分类号： H01J37/317 ,  H01J37/141 ,  H01J37/143 ,  G03F7/20

CPC分类号： H01J37/143 ,  G03F7/7015 ,  G03F7/704 ,  H01J37/141 ,  H01J37/3177 ,  H01J37/21 ,  H01J2237/1415 ,  H01J2237/1516

摘要： A fine-adjustable charged particle lens comprises a magnetic circuit assembly including permanent magnets, a yoke body, and a shunting device comprising a shunting component, and this assembly surrounds a beam passage extending along the longitudinal axis (cx). The shunting device is placed in the yoke body besides the permanent magnets and may be composed of several sector components, comprising different high magnetically permeable materials. The permanent magnet and the yoke body form a magnetic circuit having at least two gaps, in order to generate a magnetic field reaching inwards into the beam passage, into which a sleeve insert having electrostatic electrodes can be inserted, which may also generate an electric field spatially overlapping said magnetic field. The shunting device partially bypasses the magnetic flux of said circuit assembly and thus reduces the magnetic field to a desired value.

公开(公告)号：US11721517B2

公开(公告)日：2023-08-08

申请号：US17207184

申请日：2021-03-19

申请人： HITACHI HIGH-TECH SCIENCE CORPORATION

发明人： Hiroshi Oba ,  Yasuhiko Sugiyama ,  Yoshitomo Nakagawa ,  Koji Nagahara

IPC分类号： H01J37/12 ,  H01J37/09 ,  H01J37/317 ,  H01J37/08 ,  H01J37/20 ,  H01J37/21

CPC分类号： H01J37/12 ,  H01J37/08 ,  H01J37/09 ,  H01J37/20 ,  H01J37/21 ,  H01J37/3175 ,  H01J2237/31788

摘要： Provided is a focused ion beam processing apparatus including: an ion source; a sample stage a condenser lens; an aperture having a slit in a straight line shape; a projection lens and the sample stage, wherein, in a transfer mode, by Köhler illumination, with an applied voltage of the condenser lens when a focused ion beam is focused on a main surface of the projection lens scaled to be 100, the applied voltage is set to be less than 100 and greater than or equal to 80; a position of the aperture is set such that the focused ion beam is masked by the aperture with the one side of the aperture at a distance greater than 0 μm and equal to or less than 500 μm from a center of the focused ion beam; and the shape of the slit is transferred onto the sample.

公开(公告)号：US20230230798A1

公开(公告)日：2023-07-20

申请号：US18007588

申请日：2020-06-08

申请人： Hitachi High-Tech Corporation

发明人： Keisuke IGARASHI ,  Wei Chean TAN ,  Mai YOSHIHARA ,  Hiroyuki CHIBA

IPC分类号： H01J37/21 ,  H01J37/20 ,  H01J37/22

CPC分类号： H01J37/21 ,  H01J37/20 ,  H01J37/222

摘要： A technique that enables automatic focus adjustment even for a sample having regions with different heights is proposed. A charged particle beam device according to the disclosure includes: a sample holder configured to hold a sample; a sample stage configured to move the sample; a charged particle gun and a charged particle beam column configured to irradiate the sample with a charged particle beam; an objective lens configured to perform focus adjustment by changing an intensity of a focusing effect on the charged particle beam; a detector configured to detect electrons from the sample and output a signal forming an electron image; an optical imaging device configured to capture an optical image of the sample; and a control device configured to calculate height information of the sample based on the optical image obtained by imaging the sample by the optical imaging device, and automatically set a focus adjustment value of an observation site based on the height information (see FIG. 5).

公开(公告)号：US20230197401A1

公开(公告)日：2023-06-22

申请号：US18083630

申请日：2022-12-19

申请人： JEOL Ltd.

发明人： Munehiro Kozuka

IPC分类号： H01J37/21 ,  H01J37/305

CPC分类号： H01J37/21 ,  H01J37/305 ,  H01J2237/083 ,  H01J2237/20214 ,  H01J2237/24578 ,  H01J2237/30477 ,  H01J2237/31749

摘要： Provided is a sample milling apparatus capable of milling various samples efficiently. The sample milling apparatus includes an anode, a cathode for emitting electrons which are made to collide with gas molecules so that ions are generated, an extraction electrode for causing the generated ions to be extracted as an ion beam, and a focusing electrode disposed between the cathode and the extraction electrode and applied with a focusing voltage. The spatial profile of the ion beam is controlled by varying the focusing voltage applied to the focusing electrode.

公开(公告)号：US20230162945A1

公开(公告)日：2023-05-25

申请号：US17989550

申请日：2022-11-17

申请人： FEI Company

发明人： Jaroslav Velcovský ,  Jirí Kutálek ,  Radek Smolka ,  Jirí Vítecek ,  Bronislav Pribyl ,  Dávid Pacura

IPC分类号： H01J37/305 ,  H01J37/28 ,  H01J37/21 ,  H01J37/147 ,  H01J37/30 ,  B23K26/38

CPC分类号： H01J37/305 ,  H01J37/28 ,  H01J37/21 ,  H01J37/1471 ,  H01J37/3005 ,  B23K26/38 ,  H01J2237/31749 ,  H01J2237/24578 ,  H01J2237/216 ,  H01J2237/1506 ,  H01J2237/2803

摘要： The invention relates to method of milling and imaging a sample. The method comprises the step of providing an imaging system, as well as a milling beam source. The method comprises the steps of milling, using a milling beam from said milling beam source, a sample to remove a layer of the sample; and imaging, using said imaging system, an exposed surface of the sample. As defined herein, the method further comprises the step of determining a relative position of said sample, and using said determined relative position of said sample in said milling step for positioning said sample relative to said milling beam. The relative position of said sample can be a working distance with respect to the imaging system, which can be determined by means of an autofocus procedure.

公开(公告)号：US11651934B2

公开(公告)日：2023-05-16

申请号：US17490405

申请日：2021-09-30

申请人： KLA Corporation

发明人： Xinrong Jiang ,  Sameet Shriyan ,  Luca Grella ,  Kevin Cummings ,  Christopher Sears

IPC分类号： H01J37/09 ,  H01J37/14 ,  H01J37/21 ,  H01J37/28

CPC分类号： H01J37/09 ,  H01J37/14 ,  H01J37/21 ,  H01J37/28 ,  H01J2237/0453

摘要： An electron-beam device includes upper-column electron optics and lower-column electron optics. The upper-column electron optics include an aperture array to divide an electron beam into a plurality of electron beamlets. The upper-column electron optics also include a lens array with a plurality of lenses to adjust the focus of the plurality of electron beamlets. Respective lenses of the plurality of lenses are to adjust the focus of respective electron beamlets of the plurality of electron beamlets. The upper-column electron optics further include a first global lens to adjust the focus of the plurality of electron beamlets in a manner opposite to the lens array.

公开(公告)号：US20190172676A1

公开(公告)日：2019-06-06

申请号：US16184107

申请日：2018-11-08

申请人： Hitachi High-Technologies Corporation

发明人： Tomohito NAKANO ,  Toshiyuki YOKOSUKA ,  Yuko SASAKI ,  Minoru YAMAZAKI ,  Yuzuru MOCHIZUKI

IPC分类号： H01J37/21 ,  H01J37/141 ,  H01J37/244 ,  H01J37/22 ,  H01J37/20 ,  H01J37/28

CPC分类号： H01J37/21 ,  H01J37/141 ,  H01J37/20 ,  H01J37/222 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/141 ,  H01J2237/216 ,  H01J2237/2809

摘要： A charged particle beam apparatus with reduced frequency of lens resetting operations and thus with improved throughput. The apparatus includes an electron source configured to generate an electron beam, an objective lens to which coil current is adapted to be applied to converge the electron beam on a sample, a focal position adjustment device configured to adjust the focal position of the electron beam, a detector configured to detect electrons from the sample, a display unit configured to display an image of the sample in accordance with a signal from the detector, a storage unit configured to store information on the hysteresis characteristics of the objective lens, and an estimation unit configured to estimate a magnetic field generated by the objective lens on the basis of the coil current, the amount of adjustment of the focal position by the focal position adjustment device, and the information on the hysteresis characteristics.