公开(公告)号：US20140368800A1

公开(公告)日：2014-12-18

申请号：US14375264

申请日：2013-01-25

Applicant: ASML Netherlands B.V.

Inventor： Adrianus Hendrik Koevoets ,  Sjoerd Nicolaas Lambertus Donders ,  Petrus Maria Cadee

IPC: G03F7/20

CPC classification number: G03F7/70775 ,  G03F7/70833 ,  G03F7/70858

Abstract: A lithographic apparatus comprises a substrate table for accommodating a substrate; a projection system for imaging a pattern onto the substrate, and a metrology system for measuring a position of the substrate table with respect to the projection system. The metrology system comprises a metrology frame connected to the projection system, a grid positioned stationary with respect to the metrology frame, and an encoder connected to the substrate table and facing the grid for measuring the position of the substrate table relative to the grid. The metrology frame has a surface oriented towards the substrate table, and the surface has been configured, e.g., by writing or etching, so as to form the grid.

Abstract translation: 光刻设备包括用于容纳衬底的衬底台; 用于将图案成像到基板上的投影系统，以及用于测量相对于投影系统的基板台的位置的计量系统。 测量系统包括连接到投影系统的计量框架，相对于计量框架静止定位的格栅，以及连接到基板台并面向格栅的编码器，用于测量基板台相对于格栅的位置。 测量框架具有朝向衬底台的表面，并且表面已经被配置为例如通过书写或蚀刻来形成网格。