公开(公告)号：US20220382175A1

公开(公告)日：2022-12-01

申请号：US17782570

申请日：2020-11-16

Applicant: ASML Netherlands B.V.

Inventor： Sergei SOKOLOV ,  Filippo ALPEGGIANI ,  Sebastianus Adrianus GOORDEN ,  Simeon Reinaid HUISMAN

IPC: G03F9/00

Abstract: Disclosed is a method for determining a stage position or correction therefor in a lithographic process. The method comprises obtaining transmission data describing the transmission of alignment radiation onto the substrate; obtaining position data relating to a stage position of said stage and/or a sensor position of said sensor. A weighting is determined for the position data based on said transmission data. The position based on said transmission data, position data and weighting.