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公开(公告)号：US20240353761A1
公开(公告)日：2024-10-24
申请号：US18686742
申请日：2022-08-05
CPC分类号： G03F7/70633 , G03F7/70408 , G03F9/7092
摘要： Systems, apparatuses, and methods are provided for correcting an alignment measurement or overlay error. An example method can include measuring an observable in response to an illumination of a region of a surface by a radiation beam, such as interference between radiation diffracted from the region. The example method can further include generating a measurement signal indicative of the observable. In some aspects, the measurement signal can include interference fringe pattern data indicative of the measured interference. The example method can further include determining a correction to a measurement value based on measurement signal. Optionally, the correction can include a correction to an alignment measurement of an alignment sensor, a correction to an overlay error of an overlay sensor, or both.
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公开(公告)号：US20220382175A1
公开(公告)日：2022-12-01
申请号：US17782570
申请日：2020-11-16
IPC分类号： G03F9/00
摘要： Disclosed is a method for determining a stage position or correction therefor in a lithographic process. The method comprises obtaining transmission data describing the transmission of alignment radiation onto the substrate; obtaining position data relating to a stage position of said stage and/or a sensor position of said sensor. A weighting is determined for the position data based on said transmission data. The position based on said transmission data, position data and weighting.
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3.发明公开公开(公告)号：US20240094641A1
公开(公告)日：2024-03-21
申请号：US18255543
申请日：2021-12-02
发明人： Justin Lloyd KREUZER , Simon Reinald HUISMAN , Sebastianus Adrianus GOORDEN , Filippo ALPEGGIANI
IPC分类号： G03F7/00
CPC分类号： G03F7/70633 , G03F7/706837 , G03F7/706849
摘要： The system includes a radiation source, a diffractive element, an optical system, a detector, and a processor. The radiation source generates radiation. The diffractive element diffracts the radiation to generate a first beam and a second beam. The first beam includes a first non-zero diffraction order and the second beam includes a second non-zero diffraction order that is different from the first non-zero diffraction order. The optical system receives a first scattered beam and a second scattered radiation beam from a target structure and directs the first scattered beam and the second scattered beam towards a detector. The detector generates a detection signal. The processor analyzes the detection signal to determine a target structure property based on at least the detection signal. The first beam is attenuated with respect to the second beam or the first scattered beam is purposely attenuated with respect to the second scattered beam.
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4.发明公开公开(公告)号：US20230213871A1
公开(公告)日：2023-07-06
申请号：US18000087
申请日：2021-05-14
发明人： Sebastianus Adrianus GOORDEN , Filippo ALPEGGIANI , Simon Reinald HUISMAN , Johannes Jacobus Matheus BASELMANS , Haico Victor KOK , Mohamed SWILLAM , Arjan Johannes Anton BEUKMAN
CPC分类号： G03F7/70625 , G01B11/272 , G03F9/7049
摘要： A metrology system includes a radiation source, first, second, and third optical systems, and a processor. The first optical system splits the radiation into first and second beams of radiation and impart one or more phase differences between the first and second beams. The second optical system directs the first and second beams toward a target structure to produce first and second scattered beams of radiation. The third optical system interferes the first and second scattered beams at an imaging detector. The imaging detector generates a detection signal based on the interfered first and second scattered beams. The metrology system modulates one or more phase differences of the first and second scattered beams based on the imparted one or more phase differences. The processor analyzes the detection signal to determine a property of the target structure based on at least the modulated one or more phase differences.
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公开(公告)号：US20240241454A1
公开(公告)日：2024-07-18
申请号：US18619839
申请日：2024-03-28
发明人： Simon Reinald HUISMAN , Sebastianus Adrianus GOORDEN , Harm Jan Willem BELT , Filippo ALPEGGIANI , Irwan Dani SETIJA , Henricus Petrus Maria PELLEMANS
CPC分类号： G03F9/7019 , G03F7/70633 , G03F7/70641 , G03F7/706839 , G03F7/70725 , G03F9/7049 , G03F9/7088
摘要： Disclosed is a method for measuring a parameter of interest from a target and associated apparatuses. The method comprises obtaining measurement acquisition data relating to measurement of a target on a production substrate during a manufacturing phase; obtaining a calibration correction database and/or a trained model having been trained on said calibration correction database, operable to correct for effects in the measurement acquisition data; correcting for effects in the measurement acquisition data using first correction data from said calibration correction database and/or using said trained model so as to obtain corrected measurement data and/or a corrected parameter of interest which is/are corrected for at least said effects; and updating said calibration correction data and/or said trained model with said corrected measurement data and/or corrected parameter of interest.
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公开(公告)号：US20240094643A1
公开(公告)日：2024-03-21
申请号：US18269983
申请日：2021-12-20
发明人： Filippo ALPEGGIANI , Harm Jan Willem BELT , Sebatianus Adrianus GOORDEN , Irwan Dani SETIJA , Simon Reinald HUISMAN , Henricus Petrus Maria PELLEMANS
IPC分类号： G03F7/00
CPC分类号： G03F7/706845 , G03F7/70633 , G03F7/70641 , G03F7/706839
摘要： A method for measuring a parameter of interest from a target and associated apparatuses. The method includes obtaining measurement acquisition data relating to measurement of the target and finite-size effect correction data and/or a trained model operable to correct for at least finite-size effects in the measurement acquisition data. At least finite-size effects in the measurement acquisition data is corrected for using the finite-size effect correction data and/or the trained model to obtain corrected measurement data and/or obtain a parameter of interest; and where the correcting does not directly determine the parameter of interest, determining the parameter of interest from the corrected measurement data.
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公开(公告)号：US20220397832A1
公开(公告)日：2022-12-15
申请号：US17773384
申请日：2020-10-19
发明人： Filippo ALPEGGIANI , Henricus Petrus Maria PELLEMANS , Sebastianus Adrianus GOORDEN , Simon Reinald HUISMAN
摘要： Disclosed is a method of metrology such as alignment metrology. The method comprises obtaining pupil plane measurement dataset at a pupil plane relating to scattered radiation resultant from a measurement of a structure. The method comprises determining a measurement value or correction therefor using the pupil plane measurement dataset and a sensor term relating to sensor optics used to perform said measurement.
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