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1.
公开(公告)号:US20240152059A1
公开(公告)日:2024-05-09
申请号:US18281519
申请日:2022-03-09
Applicant: ASML NETHERLANDS B.V.
Inventor: Dogacan KARA , Erik JENSEN , Jochem Sebastiaan WILDENBERG , David Frans Simon DECKERS , Sila GULER , Reinaldo Antonio ASTUDILLO RENGIFO , Yasri YUDHISTIRA , Gijs HILHORST , David Ricardo CAICEDO FERNANDEZ , Frans Reinier SPIERING , Sinatra Canggih KHO , Herman Martin BLOM , Sang Uk KIM , Hyun-Su KIM
IPC: G03F7/00
CPC classification number: G03F7/705 , G03F7/70633
Abstract: A method for determining a substrate model for describing a first measurement dataset and a second measurement dataset relating to a performance parameter. The method include obtaining candidate basis functions for a plurality of substrate models. Steps 1 to 4 are performed iteratively for the first measurement dataset and the second measurement dataset until at least one stopping criterion is met so as to determine the substrate model, the steps including: 1. selecting a candidate basis function from the candidate basis functions; 2. updating a substrate model by adding the candidate basis function into this substrate model to obtain an updated substrate model; 3. evaluating the updated substrate model based on the first measurement dataset and/or second measurement dataset; and 4. determining whether to include the basis function within the substrate model based on the evaluation.
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公开(公告)号:US20170090301A1
公开(公告)日:2017-03-30
申请号:US15270150
申请日:2016-09-20
Applicant: ASML Netherlands B.V.
Inventor: Alok VERMA , Sinatra Canggih KHO , Adriaan Johan VAN LEEST
IPC: G03F7/20
CPC classification number: G03F7/70625 , G03F7/705 , G03F7/70633 , G03F9/7092
Abstract: This disclosure includes a variety of methods of describing a shape in a hierarchical manner, and uses of such a hierarchical description. In particular, this disclosure includes a method comprising: fitting one or more sub-shapes of a first order against a shape; determining an error of the fitting; and fitting one or more sub-shapes of a second order against the error.
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