公开(公告)号：US11774865B2

公开(公告)日：2023-10-03

申请号：US17636765

申请日：2020-07-24

Applicant: ASML Netherlands B.V.

Inventor： Thijs Adriaan Cornelis Van Keulen ,  Hendrikus Herman Marie Cox ,  Ramidin Izair Kamidi ,  Willem Herman Gertruda Anna Koenen

IPC: G03F7/20 ,  G03F7/00 ,  G03F9/00 ,  H01L21/68

CPC classification number: G03F7/70725 ,  G03F7/70216 ,  G03F9/7003 ,  H01L21/682

Abstract: A method of determining a desired relative position between a first object of a lithographic apparatus and a second object of the lithographic apparatus. Generating a measurement signal representing a position of the first object relative to the second object, at an initial relative position. Determining a gradient associated with the initial relative position, based on the measurement signal. Determining a position set point based on the gradient and wherein the position set point comprises a three-dimensional dither signal. Controlling the position of the first object relative to the second object to a further relative position, based on the position set point.