SEMICONDUCTOR INTEGRATED CIRCUIT
    1.
    发明申请
    SEMICONDUCTOR INTEGRATED CIRCUIT 有权
    半导体集成电路

    公开(公告)号:US20120320482A1

    公开(公告)日:2012-12-20

    申请号:US13495797

    申请日:2012-06-13

    IPC分类号: H02H3/20

    CPC分类号: H03F3/45188

    摘要: A semiconductor integrated circuit that is efficiently reduced in a noise level is offered. P-channel type MOS transistors M1 and M2 serving as differential input transistors have a thin gate oxide film in order to reduce the noise level. A protection circuit to protect the P-channel type MOS transistors M1 and M2 from overvoltage is formed including P-channel type MOS transistors M3 and M4. The P-channel type MOS transistor M3 is a first protection transistor to protect the P-channel type MOS transistor M1 from overvoltage, and is connected to a drain of the P-channel type MOS transistor M1. The P-channel type MOS transistor M4 is a second protection transistor to protect the P-channel type MOS transistor M2 from overvoltage, and is connected to a drain of the P-channel type MOS transistor M2.

    摘要翻译: 提供了可以有效降低噪声水平的半导体集成电路。 用作差分输入晶体管的P沟道型MOS晶体管M1和M2具有薄的栅极氧化膜,以便降低噪声水平。 形成保护P沟道型MOS晶体管M1和M2免受过电压的保护电路,其包括P沟道型MOS晶体管M3和M4。 P沟道型MOS晶体管M3是用于保护P沟道型MOS晶体管M1免受过电压的第一保护晶体管,并且连接到P沟道型MOS晶体管M1的漏极。 P沟道型MOS晶体管M4是用于保护P沟道型MOS晶体管M2免受过电压的第二保护晶体管,并且连接到P沟道型MOS晶体管M2的漏极。

    Semiconductor integrated circuit
    2.
    发明授权
    Semiconductor integrated circuit 有权
    半导体集成电路

    公开(公告)号:US08773831B2

    公开(公告)日:2014-07-08

    申请号:US13495797

    申请日:2012-06-13

    IPC分类号: H02H3/20

    CPC分类号: H03F3/45188

    摘要: A semiconductor integrated circuit that is efficiently reduced in a noise level is offered. P-channel type MOS transistors M1 and M2 serving as differential input transistors have a thin gate oxide film in order to reduce the noise level. A protection circuit to protect the P-channel type MOS transistors M1 and M2 from overvoltage is formed including P-channel type MOS transistors M3 and M4. The P-channel type MOS transistor M3 is a first protection transistor to protect the P-channel type MOS transistor M1 from overvoltage, and is connected to a drain of the P-channel type MOS transistor M1. The P-channel type MOS transistor M4 is a second protection transistor to protect the P-channel type MOS transistor M2 from overvoltage, and is connected to a drain of the P-channel type MOS transistor M2.

    摘要翻译: 提供了可以有效降低噪声水平的半导体集成电路。 用作差分输入晶体管的P沟道型MOS晶体管M1和M2具有薄的栅极氧化膜,以便降低噪声水平。 形成保护P沟道型MOS晶体管M1和M2免受过电压的保护电路,其包括P沟道型MOS晶体管M3和M4。 P沟道型MOS晶体管M3是用于保护P沟道型MOS晶体管M1免受过电压的第一保护晶体管,并且连接到P沟道型MOS晶体管M1的漏极。 P沟道型MOS晶体管M4是用于保护P沟道型MOS晶体管M2免受过电压的第二保护晶体管,并且连接到P沟道型MOS晶体管M2的漏极。