公开(公告)号：US11499666B2

公开(公告)日：2022-11-15

申请号：US16400090

申请日：2019-05-01

Applicant: Applied Materials, Inc.

Inventor： Jason M. Schaller ,  Michael P. Rohrer ,  Tuan Anh Nguyen

IPC: F16M11/18 ,  F16M11/12 ,  F16F1/12 ,  C23C16/44 ,  H01L21/687 ,  F16M11/04 ,  H01L21/68

Abstract: Embodiments described herein relate to a precision dynamic leveling mechanism for repeatedly positioning the pedestal within a process. The precision dynamic leveling mechanism includes bearing assemblies. Bearing assemblies having inner races forced against a pedestal assembly carrier and outer races forced against a guide adaptor provide nominal clearance between the inner races and outer races to allow the inner races and the outer races to slide on each other with minimal or no radial motion.