公开(公告)号：US20250027195A1

公开(公告)日：2025-01-23

申请号：US18223199

申请日：2023-07-18

Applicant: Applied Materials, Inc.

Inventor： Yogesh Tomar ,  Nikshep Patil ,  Kirubanandan Shanmugam Naina ,  Hanish Kumar Panavalappil Kumarankutty ,  Gayatri Natu ,  Mahesh Chelvaraj Arcot ,  Senthil Kumar Nattamai Subramanian ,  Hari Venkatesh Rajendran ,  Michael Rice ,  Christopher Laurent Beaudry

IPC: C23C16/455 ,  C23C16/44 ,  C23C16/52

Abstract: A method includes performing an atomic layer deposition (ALD) process with respect to a plurality of target elements to coat interiors of the plurality of target elements with a protective coating. Performing the ALD process includes alternating delivery of a first precursor inside the plurality of target elements for a first duration to form an adsorption layer on the interiors of the plurality of target elements, alternating purging of the first precursor from the plurality of target elements for a second duration, and alternating delivery of a second precursor inside the plurality of target elements for a third duration to cause the second precursor to react with the adsorption layer and form a target layer on the interiors of the plurality of target elements.