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公开(公告)号:US10739247B2
公开(公告)日:2020-08-11
申请号:US16176834
申请日:2018-10-31
Inventor: Bryan D. Lee , Christopher M. Palie , Andrew J. Radl
Abstract: A system and process for testing and analyzing a laser beam is provided. The system and process allows for repeatable testing of a laser beam to provide a beam intensity profile while accounting for variation in measurements attributable to outside factors. The system and process further allows for simultaneous measurement and analysis of a laser beam having multiple wavelengths.
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公开(公告)号:US20200132591A1
公开(公告)日:2020-04-30
申请号:US16176834
申请日:2018-10-31
Inventor: Bryan D. Lee , Christopher M. Palie , Andrew J. Radl
Abstract: A system and process for testing and analyzing a laser beam is provided. The system and process allows for repeatable testing of a laser beam to provide a beam intensity profile while accounting for variation in measurements attributable to outside factors. The system and process further allows for simultaneous measurement and analysis of a laser beam having multiple wavelengths.
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