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公开(公告)号：US20160200720A1
公开(公告)日：2016-07-14
申请号：US15073912
申请日：2016-03-18
Applicant: BAYER INTELLECTUAL PROPERTY GMBH
Inventor： Tomoki TSUCHIYA , Pierre WASNAIRE , Sebastian HOFFMANN , Thomas SEITZ , Stefan HILLEBRAND , Juergen BENTING , Jan Peter SCHMIDT , Pierre CRISTAU
IPC: C07D417/14 , A01N43/40 , C07D211/62 , A01N43/80 , C07D261/04
CPC classification number: A01N43/80 , A01N43/40 , C07D211/62 , C07D261/04 , C07D261/08 , C07D417/14 , C07D419/14
Abstract: Heteroarylpiperidine and -piperazine derivatives of the formula (I) in which the symbols RA1, RA2, X, Y, L1, L2, RB1, RB2, G, Q, p, R1, R2 and R10 are each as defined in the description, and salts, metal complexes and N-oxides of the compounds of the formula (I), and the use thereof for controlling phytopathogenic harmful fungi and processes for preparing compounds of the formula (I).
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公开(公告)号：US20170044154A1
公开(公告)日：2017-02-16
申请号：US15339595
申请日：2016-10-31
Applicant: BAYER INTELLECTUAL PROPERTY GMBH
Inventor： Stefan HILLEBRAND , Pierre CRISTAU , Sebastian HOFFMANN , Joachim KLUTH , Pierre WASNAIRE , Tomoki TSUCHIYA , Juergen BENTING , Ulrike WACHENDORFF-NEUMANN , Thomas SEITZ
IPC: C07D417/14 , A01N43/80
CPC classification number: C07D417/14 , A01N43/80
Abstract: Heteroarylpiperidine and -piperazine derivatives of the formula (I) in which the symbols A, X, Y, L1, L2, G, Q, p, R1, R2 and R10 are each as defined in the description, and salts, metal complexes and N-oxides of the compounds of the formula (I), and the use thereof for controlling phytopathogenic harmful fungi and processes for preparing compounds of the formula (I).
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3.发明申请公开(公告)号：US20150218152A1
公开(公告)日：2015-08-06
申请号：US14598895
申请日：2015-01-16
Applicant: BAYER INTELLECTUAL PROPERTY GMBH
Inventor： Stefan HILLEBRAND , Pierre CRISTAU , Sebastian HOFFMANN , Joachim KLUTH , Pierre WASNAIRE , Tomoki TSUCHIYA , Juergen BENTING , Ulrike WACHENDORFF-NEUMANN , Thomas SEITZ
IPC: C07D417/14 , A01N43/80
CPC classification number: C07D417/14 , A01N43/80
Abstract: Heteroarylpiperidine and -piperazine derivatives of the formula (I) in which the symbols A, X, Y, L1, L2, G, Q, p, R1, R2 and R10 are each as defined in the description, and salts, metal complexes and N-oxides of the compounds of the formula (I), and the use thereof for controlling phytopathogenic harmful fungi and processes for preparing compounds of the formula (I).
Abstract translation: 符号A，X，Y，L1，L2，G，Q，p，R1，R2和R10各自如说明书中所定义的式（I）的杂芳基哌啶和哌嗪衍生物，以及盐，金属络合物和 式（I）化合物的N-氧化物及其用于控制植物病原性有害真菌的用途及其制备式（I）化合物的方法。
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Patent Agency Ranking
公开(公告)号：US20150175598A1
公开(公告)日：2015-06-25
申请号：US14637686
申请日：2015-03-04
Applicant: Bayer Intellectual Property GmbH
Inventor： Tomoki TSUCHIYA , Pierre WASNAIRE , Sebastian HOFFMANN , Pierre CRISTAU , Thomas SEITZ , Joachim KLUTH , Stefan HILLEBRAND , Juergen BENTING , Daniela PORTZ , Ulrike WACHENDORFF-NEUMANN
CPC classification number: A01N43/80 , A01N43/78 , A01N47/22 , A01N47/38 , A01N55/00 , C07D417/14 , C07F7/0812
Abstract: Heteroarylpiperidine and -piperazine derivatives of the formula (I) in which the symbols A, X, Y, L1, L2, G, Q, p, R1, R2 and R10 are each as defined in the description, and salts, metal complexes and N-oxides of the compounds of the formula (I), and the use thereof for controlling phytopathogenic harmful fungi and processes for preparing compounds of the formula (I).
Abstract translation: 符号A，X，Y，L1，L2，G，Q，p，R1，R2和R10各自如说明书中所定义的式（I）的杂芳基哌啶和哌嗪衍生物，以及盐，金属络合物和 式（I）化合物的N-氧化物及其用于控制植物病原性有害真菌的用途及其制备式（I）化合物的方法。
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公开(公告)号：US20160214970A1
公开(公告)日：2016-07-28
申请号：US15008557
申请日：2016-01-28
Applicant: Bayer Intellectual Property GmbH
Inventor： Pierre CRISTAU , Sebastian HOFFMANN , Joachim KLUTH , Tomoki TSUCHIYA , Pierre WASNAIRE , Jurgen BENTING , Daniela PORTZ , Ulrike WACHENDORFF-NEUMANN , Stefan HILLEBRAND
IPC: C07D417/04 , C07D417/14
CPC classification number: C07D417/04 , A01N43/78 , C07D417/14
Abstract: Bis(difluoromethyl)pyrazole derivatives of the formula (I) in which the symbols R1, X and G are each as defined in the description, and agrochemically active salts, metal complexes and N-oxides thereof, and use thereof for controlling phytopathogenic harmful fungi, and also processes for preparing compounds of the formula (I).
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6.发明申请公开(公告)号：US20170044153A1
公开(公告)日：2017-02-16
申请号：US15339576
申请日：2016-10-31
Applicant: BAYER INTELLECTUAL PROPERTY GMBH
Inventor： Stefan HILLEBRAND , Pierre CRISTAU , Sebastian HOFFMANN , Joachim KLUTH , Pierre WASNAIRE , Tomoki TSUCHIYA , Juergen BENTING , Ulrike WACHENDORFF-NEUMANN , Thomas SEITZ
IPC: C07D417/14 , A01N43/80
CPC classification number: C07D417/14 , A01N43/80
Abstract: Heteroarylpiperidine and -piperazine derivatives of the formula (I) in which the symbols A, X, Y, L1, L2, G, Q, p, R1, R2 and R10 are each as defined in the description, and salts, metal complexes and N-oxides of the compounds of the formula (I), and the use thereof for controlling phytopathogenic harmful fungi and processes for preparing compounds of the formula (I).
Abstract translation: 其中符号A，X，Y，L1，L2，G，Q，p，R1，R2和R10各自如说明书中所定义，并且式（I）化合物的盐，金属络合物和N-氧化物 ）及其用于控制植物病原性有害真菌的用途及其制备式（I）化合物的方法。
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公开(公告)号：US20160309719A1
公开(公告)日：2016-10-27
申请号：US15202196
申请日：2016-07-05
Applicant: Bayer Intellectual Property GmbH
Inventor： Tomoki TSUCHIYA , Pierre WASNAIRE , Sebastian HOFFMANN , Pierre CRISTAU , Thomas SEITZ , Joachim KLUTH , Stefan HILLEBRAND , Juergen BENTING , Daniela PORTZ , Ulrike WACHENDORFF-NEUMANN
IPC: A01N43/80 , C07D417/14 , C07F7/08 , A01N55/00
CPC classification number: A01N43/80 , A01N43/78 , A01N47/22 , A01N47/38 , A01N55/00 , C07D417/14 , C07F7/0812
Abstract: Heteroarylpiperidine and -piperazine derivatives of the formula (I) in which the symbols A, X, Y, L1, L2, G, Q, p, R1, R2 and R10 are each as defined in the description, and salts, metal complexes and N-oxides of the compounds of the formula (I), and the use thereof for controlling phytopathogenic harmful fungi and processes for preparing compounds of the formula (I).
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8.发明申请公开(公告)号：US20150065551A1
公开(公告)日：2015-03-05
申请号：US14486282
申请日：2014-09-15
Applicant: Bayer Intellectual Property GmbH
Inventor： Thomas SEITZ , Ulrike WACHENDORFF-NEUMANN , Jürgen BENTING , Peter DAHMEN , Arnd VOERSTE , Ralf DUNKEL , Stefan HILLEBRAND , Klaus-Günther TIETJEN , Stephane BRUNET
IPC: A01N43/90 , C07D495/14
CPC classification number: A01N43/90 , C07D495/14
Abstract: The present invention relates to the use of novel and of known dithiine-tetracarboximides for controlling phytopathogenic fungi, and to methods of controlling phytopathogenic fungi in plant protection, and to plant protection compositions comprising these dithiine-tetracarboximides.
Abstract translation: 本发明涉及新颖的和已知的二硫代 - 四羧酸二异氰酸酯用于防治植物病原性真菌的用途，以及用于控制植物保护中植物病原真菌的方法，以及植物保护组合物，包括这些二硫代 - 四甲酰亚胺。
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