公开(公告)号：US20160200720A1

公开(公告)日：2016-07-14

申请号：US15073912

申请日：2016-03-18

Applicant: BAYER INTELLECTUAL PROPERTY GMBH

Inventor： Tomoki TSUCHIYA ,  Pierre WASNAIRE ,  Sebastian HOFFMANN ,  Thomas SEITZ ,  Stefan HILLEBRAND ,  Juergen BENTING ,  Jan Peter SCHMIDT ,  Pierre CRISTAU

IPC: C07D417/14 ,  A01N43/40 ,  C07D211/62 ,  A01N43/80 ,  C07D261/04

CPC classification number: A01N43/80 ,  A01N43/40 ,  C07D211/62 ,  C07D261/04 ,  C07D261/08 ,  C07D417/14 ,  C07D419/14

Abstract: Heteroarylpiperidine and -piperazine derivatives of the formula (I) in which the symbols RA1, RA2, X, Y, L1, L2, RB1, RB2, G, Q, p, R1, R2 and R10 are each as defined in the description, and salts, metal complexes and N-oxides of the compounds of the formula (I), and the use thereof for controlling phytopathogenic harmful fungi and processes for preparing compounds of the formula (I).

公开(公告)号：US20150368237A1

公开(公告)日：2015-12-24

申请号：US14838553

申请日：2015-08-28

Applicant: Bayer Intellectual Property GmbH

Inventor： Sebastian HOFFMAN ,  Pierre WASNAIRE ,  Tomoki TSUCHIYA ,  Pierre CRISTAU ,  Thomas SEITZ ,  Joachim KLUTH ,  Jurgen BENTING ,  Ulrike WACHENDORFF-NEUMANN

IPC: C07D417/14

CPC classification number: C07D417/14 ,  A01N43/80 ,  C07D417/04

Abstract: Heteroarylpiperidine and -piperazine derivatives of the formula (I) in which the symbols are each as defined in the description, and agrochemically active salts thereof, and use thereof for controlling phytopathogenic harmful fungi, and also processes for preparing compounds of the formula (I).

Abstract translation: 符号分别如说明书中所定义的式（I）的杂芳基哌啶和哌嗪衍生物及其农业化学活性盐及其用于控制​​植物病原性有害真菌的用途，以及制备式（I）化合物的方法， 。

公开(公告)号：US20140031553A1

公开(公告)日：2014-01-30

申请号：US14039806

申请日：2013-09-27

Applicant: Bayer Intellectual Property GmbH

Inventor： Pierre CRISTAU ,  Stefan HERRMANN ,  Nicola RAHN ,  Arnd VOERSTE ,  Ulrike WACHENDORFF-NEUMANN ,  Tomoki TSUCHIYA

IPC: A01N43/78 ,  A01N43/56

CPC classification number: A01N43/78 ,  A01N43/56 ,  C07D417/04 ,  C07D417/14

Abstract: The use of thiazole-4-carboxylic esters and thioesters of the formula (I) in which R1, R2, R3, R4, R5, R6, R7, Y1, Y2, Y3, W, X and G have the meanings given in the description, and also of agrochemically active salts thereof, as fungicides.

Abstract translation: 使用式（I）的噻唑-4-羧酸酯和硫酯，其中R 1，R 2，R 3，R 4，R 5，R 6，R 7，Y 1，Y 2，Y 3，W，X和G具有 描述，以及其农业化学活性盐，作为杀真菌剂。

公开(公告)号：US20170044153A1

公开(公告)日：2017-02-16

申请号：US15339576

申请日：2016-10-31

Applicant: BAYER INTELLECTUAL PROPERTY GMBH

Inventor： Stefan HILLEBRAND ,  Pierre CRISTAU ,  Sebastian HOFFMANN ,  Joachim KLUTH ,  Pierre WASNAIRE ,  Tomoki TSUCHIYA ,  Juergen BENTING ,  Ulrike WACHENDORFF-NEUMANN ,  Thomas SEITZ

IPC: C07D417/14 ,  A01N43/80

CPC classification number: C07D417/14 ,  A01N43/80

Abstract: Heteroarylpiperidine and -piperazine derivatives of the formula (I) in which the symbols A, X, Y, L1, L2, G, Q, p, R1, R2 and R10 are each as defined in the description, and salts, metal complexes and N-oxides of the compounds of the formula (I), and the use thereof for controlling phytopathogenic harmful fungi and processes for preparing compounds of the formula (I).

Abstract translation: 其中符号A，X，Y，L1，L2，G，Q，p，R1，R2和R10各自如说明书中所定义，并且式（I）化合物的盐，金属络合物和N-氧化物 ）及其用于控制​​植物病原性有害真菌的用途及其制备式（I）化合物的方法。

公开(公告)号：US20160309719A1

公开(公告)日：2016-10-27

申请号：US15202196

申请日：2016-07-05

Applicant: Bayer Intellectual Property GmbH

Inventor： Tomoki TSUCHIYA ,  Pierre WASNAIRE ,  Sebastian HOFFMANN ,  Pierre CRISTAU ,  Thomas SEITZ ,  Joachim KLUTH ,  Stefan HILLEBRAND ,  Juergen BENTING ,  Daniela PORTZ ,  Ulrike WACHENDORFF-NEUMANN

IPC: A01N43/80 ,  C07D417/14 ,  C07F7/08 ,  A01N55/00

CPC classification number: A01N43/80 ,  A01N43/78 ,  A01N47/22 ,  A01N47/38 ,  A01N55/00 ,  C07D417/14 ,  C07F7/0812

Abstract: Heteroarylpiperidine and -piperazine derivatives of the formula (I) in which the symbols A, X, Y, L1, L2, G, Q, p, R1, R2 and R10 are each as defined in the description, and salts, metal complexes and N-oxides of the compounds of the formula (I), and the use thereof for controlling phytopathogenic harmful fungi and processes for preparing compounds of the formula (I).

公开(公告)号：US20160280633A1

公开(公告)日：2016-09-29

申请号：US15176653

申请日：2016-06-08

Applicant: BAYER INTELLECTUAL PROPERTY GMBH

Inventor： Jurgen BENTING ,  Philippe DESBORDES ,  Pierre CRISTAU ,  Christophe DUBOST ,  Mazen ES-SAYED ,  Stephanie GARY ,  Helene LACHAISE ,  Philippe RINOLFI ,  Jan-Peter SCHMIDT ,  Tomoki TSUCHIYA ,  Jean-Pierre VORS ,  Ulrike WACHENDORFF-NEUMANN

IPC: C07C211/40

CPC classification number: C07C211/40 ,  A01N33/08 ,  C07C225/20 ,  C07C2601/04 ,  C07C2601/10 ,  C07C2601/16 ,  C07C2601/18 ,  C07D231/14

Abstract: The present invention relates to fungicidal N-cycloalkyl-N-[(cycloalkenylphenyl)methylene]carboxamide derivatives and their thiocarbonyl derivatives, their process of preparation and intermediate compounds for their preparation, their use as fungicides, particularly in the form of fungicidal compositions and methods for the control of phytopathogenic fungi of plants using these compounds or their compositions.

Abstract translation: 本发明涉及杀真菌N-环烷基-N - [（环烯基苯基）亚甲基]甲酰胺衍生物及其硫代羰基衍生物，其制备方法及其制备中间体化合物，其用作杀真菌剂，特别是以杀真菌剂组合物和方法 用于使用这些化合物或其组合物来控制植物的致病真菌。

公开(公告)号：US20150237859A1

公开(公告)日：2015-08-27

申请号：US14678174

申请日：2015-04-03

Applicant: Bayer Intellectual Property GmbH

Inventor： Pierre CRISTAU ,  Stefan HERRMANN ,  Nicola RAHN ,  Arnd VOERSTE ,  Ulrike WACHENDORFF-NEUMANN ,  Tomoki TSUCHIYA

IPC: A01N43/78 ,  C07D417/04 ,  C07D417/14

CPC classification number: A01N43/78 ,  A01N43/56 ,  C07D417/04 ,  C07D417/14

Abstract: The use of thiazole-4-carboxylic esters and thioesters of the formula (I) in which R1, R2, R3, R4, R5, R6, R7, Y1, Y2, Y3, W, X and G have the meanings given in the description, and also of agrochemically active salts thereof, as fungicides.

Abstract translation: 使用式（I）的噻唑-4-羧酸酯和硫酯，其中R 1，R 2，R 3，R 4，R 5，R 6，R 7，Y 1，Y 2，Y 3，W，X和G具有 描述，以及其农业化学活性盐，作为杀真菌剂。

公开(公告)号：US20180103641A1

公开(公告)日：2018-04-19

申请号：US15798082

申请日：2017-10-30

Applicant: BAYER INTELLECTUAL PROPERTY GMBH

Inventor： Tomoki TSUCHIYA ,  Pierre Wasnaire ,  Sebastian Hoffmann ,  Thomas Seitz ,  Stefan Hillebrand ,  Juergen Benting ,  Jan Peter Schmidt ,  Pierre Cristau

IPC: A01N43/80 ,  C07D211/62 ,  C07D417/14 ,  C07D261/04 ,  C07D419/14 ,  A01N43/40 ,  C07D261/08

CPC classification number: A01N43/80 ,  A01N43/40 ,  C07D211/62 ,  C07D261/04 ,  C07D261/08 ,  C07D417/14 ,  C07D419/14

Abstract: Heteroarylpiperidine and -piperazine derivatives of the formula (I) in which the symbols RA1, RA2, X, Y, L1, L2, RB1, RB2, G, Q, p, R1, R2 and R10 are each as defined in the description, and salts, metal complexes and N-oxides of the compounds of the formula (I), and the use thereof for controlling phytopathogenic harmful fungi and processes for preparing compounds of the formula (I).

公开(公告)号：US20160214970A1

公开(公告)日：2016-07-28

申请号：US15008557

申请日：2016-01-28

Applicant: Bayer Intellectual Property GmbH

Inventor： Pierre CRISTAU ,  Sebastian HOFFMANN ,  Joachim KLUTH ,  Tomoki TSUCHIYA ,  Pierre WASNAIRE ,  Jurgen BENTING ,  Daniela PORTZ ,  Ulrike WACHENDORFF-NEUMANN ,  Stefan HILLEBRAND

IPC: C07D417/04 ,  C07D417/14

CPC classification number: C07D417/04 ,  A01N43/78 ,  C07D417/14

Abstract: Bis(difluoromethyl)pyrazole derivatives of the formula (I) in which the symbols R1, X and G are each as defined in the description, and agrochemically active salts, metal complexes and N-oxides thereof, and use thereof for controlling phytopathogenic harmful fungi, and also processes for preparing compounds of the formula (I).

公开(公告)号：US20170044154A1

公开(公告)日：2017-02-16

申请号：US15339595

申请日：2016-10-31

Applicant: BAYER INTELLECTUAL PROPERTY GMBH

Inventor： Stefan HILLEBRAND ,  Pierre CRISTAU ,  Sebastian HOFFMANN ,  Joachim KLUTH ,  Pierre WASNAIRE ,  Tomoki TSUCHIYA ,  Juergen BENTING ,  Ulrike WACHENDORFF-NEUMANN ,  Thomas SEITZ

IPC: C07D417/14 ,  A01N43/80

CPC classification number: C07D417/14 ,  A01N43/80

Abstract: Heteroarylpiperidine and -piperazine derivatives of the formula (I) in which the symbols A, X, Y, L1, L2, G, Q, p, R1, R2 and R10 are each as defined in the description, and salts, metal complexes and N-oxides of the compounds of the formula (I), and the use thereof for controlling phytopathogenic harmful fungi and processes for preparing compounds of the formula (I).