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公开(公告)号：US20180059447A1
公开(公告)日：2018-03-01
申请号：US15656477
申请日：2017-07-21
发明人： Min Xu , Zhen Wei , Shibo Guo , Qiang Zhang , Yongbo Gong , Mingming Shen
IPC分类号： G02F1/13
CPC分类号： G02F1/1303 , G02F1/136204 , G02F1/1368 , H01L21/68742
摘要： An elevating mechanism is provided in the embodiments of the disclosure, which relates to the technical field of a substrate carrying mechanism device and is capable of decreasing incidence of an electrostatic-breakdown phenomenon of a substrate to be processed during an ascending-descending process thereof. The elevating mechanism is configured to carry the substrate to be processed, including a plurality of struts, each of which is provided at a supporting end thereof with a support portion which is in contact with the substrate to be processed, by means of a supporting surface provided on the support portion when the elevating mechanism carries the substrate to be processed; and an ionic wind supply. Each of the plurality of struts is provided with a channel which is arranged inside a corresponding one of the plurality of the struts and penetrates therethrough and is configured to deliver an ionic wind outputted from the ionic wind supply into the corresponding one of the plurality of struts; and each of the plurality of struts is provided at least at a location of the supporting surface on the support portion with a plurality of first vent holes in communication with the channel thereof, through which the ionic wind delivered by the ionic wind supply is blown towards the substrate to be processed.
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公开(公告)号：US10386661B2
公开(公告)日：2019-08-20
申请号：US15656477
申请日：2017-07-21
发明人： Min Xu , Zhen Wei , Shibo Guo , Qiang Zhang , Yongbo Gong , Mingming Shen
IPC分类号： H01L21/68 , G02F1/13 , G02F1/1362 , H01L21/687 , G02F1/1368
摘要： An elevating mechanism is provided in the embodiments of the disclosure, which relates to the technical field of a substrate carrying mechanism device and is capable of decreasing incidence of an electrostatic-breakdown phenomenon of a substrate to be processed during an ascending-descending process thereof. The elevating mechanism is configured to carry the substrate to be processed, including a plurality of struts, each of which is provided at a supporting end thereof with a support portion which is in contact with the substrate to be processed, by means of a supporting surface provided on the support portion when the elevating mechanism carries the substrate to be processed; and an ionic wind supply. Each of the plurality of struts is provided with a channel which is arranged inside a corresponding one of the plurality of the struts and penetrates therethrough and is configured to deliver an ionic wind outputted from the ionic wind supply into the corresponding one of the plurality of struts; and each of the plurality of struts is provided at least at a location of the supporting surface on the support portion with a plurality of first vent holes in communication with the channel thereof, through which the ionic wind delivered by the ionic wind supply is blown towards the substrate to be processed.
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