公开(公告)号：US20040146637A1

公开(公告)日：2004-07-29

申请号：US10757630

申请日：2004-01-15

Applicant: CANON KABUSHIKI KAISHA

Inventor： Yoshikazu Banno ,  Etsuro Kishi ,  Mitsutoshi Hasegawa ,  Kazuhiro Sando ,  Kazuya Shigeoka ,  Masahiko Miyamoto

IPC: B05D005/12 ,  B05D001/02

CPC classification number: H01J1/316 ,  H01J9/027 ,  H01J2201/3165 ,  H01J2329/00

Abstract: A method of producing an electron-emitting device includes the steps of forming a pair of electrodes and an electrically-conductive thin film on a substrate in such a manner that the pair of electrodes are in contact with the electrically-conductive thin film and forming an electron emission region using the electrically-conductive thin film, wherein the method is characterized in that a solution containing a metal element is supplied in a droplet form onto the substrate thereby forming the electrically-conductive thin film.

Abstract translation: 制造电子发射器件的方法包括以下步骤：在衬底上形成一对电极和导电薄膜，使得该对电极与导电薄膜接触并形成 电子发射区域，其中所述方法的特征在于，将含有金属元素的溶液以液滴形式供应到所述基板上，从而形成所述导电薄膜。

公开(公告)号：US20040213897A1

公开(公告)日：2004-10-28

申请号：US10853762

申请日：2004-05-26

Applicant: CANON KABUSHIKI KAISHA

Inventor： Masahiko Miyamoto ,  Mitsutoshi Hasegawa ,  Kazuhiro Sando ,  Kazuya Shigeoka

IPC: B05D005/12

CPC classification number: H01J9/027 ,  H01J2329/00

Abstract: A novel process for producing an electron source substrate is disclosed for formation of electron-emitting element at high efficiency with less shape irregularity. In the process, the region for electroconductive film formation is divided into plural subregions on which an electroconductive film is formed respectively. In forming the electroconductive film by application of plural liquids, the time interval between the application of the two drops is controlled to be larger than the time length necessary for suppressing the spreading of the succeedingly applied liquid within an allowable limit.

Abstract translation: 公开了一种制造电子源基片的新方法，用于以较低的形状不规则形成高效率的电子发射元件。 在该过程中，用于导电膜形成的区域被分成多个分别形成导电膜的子区域。 在通过施加多种液体形成导电膜时，将两滴的施加之间的时间间隔控制为大于在随后施加的液体的扩散中允许的极限内所需的时间长度。