GLASS SUBSTRATE HEAT CHAMFERING METHOD AND APPARATUS

    公开(公告)号:US20240076226A1

    公开(公告)日:2024-03-07

    申请号:US18039532

    申请日:2021-12-17

    CPC classification number: C03B33/091 C03B33/074 B23K26/38

    Abstract: Provided is a glass substrate heat chamfering method. An edge of a glass substrate (100) is chamfered by applying thermal shock to the edge of the glass substrate (100), thereby peeling a strip (100a) off from the edge of the glass substrate (100). The strip is cut at a predetermined point thereon before being broken due to the weight thereof. The strip (100a) is cut by applying at least one of heat and a laser beam to the predetermined point or by applying a flame (300a) of a torch (300) to the predetermined point. The application of the thermal shock includes brining a heating element (210) into contact with the edge of the glass substrate (100). In the chamfering, the heating element (210) is relatively moved along the edge of the glass substrate (100) while being brought into contact with the edge of the glass substrate (100).

Patent Agency Ranking