Two piece shutter disk assembly for a substrate process chamber
    1.
    发明授权
    Two piece shutter disk assembly for a substrate process chamber 有权
    用于基板处理室的两片快门盘组件

    公开(公告)号:US09252002B2

    公开(公告)日:2016-02-02

    申请号:US13550997

    申请日:2012-07-17

    IPC分类号: C23C14/00 H01J37/34

    摘要: Shutter disk assemblies for use in process chambers to protect a substrate support disposed below the shutter disk assembly from undesired material deposition are provided herein. In some embodiments, a shutter disk assembly for use in a process chamber to protect a substrate support disposed below the shutter disk assembly may include an upper disk member having a top surface and a bottom surface; and a lower carrier member having at least a portion of the lower carrier member disposed below a portion of the upper disk member to support the upper disk member and to create a protective overlap region that prevents exposure of the substrate support upon deformation of the upper disk member.

    摘要翻译: 本文提供了用于处理室中用于保护设置在快门盘组件下方的基板支撑件的不需要的材料沉积的快门盘组件。 在一些实施例中,用于处理室中用于保护设置在快门盘组件下方的基板支撑件的快门盘组件可包括具有顶表面和底表面的上盘构件; 以及下承载构件,其具有下载架构件的至少一部分设置在上盘构件的一部分的下方以支撑上盘构件,并且形成保护重叠区域,防止衬底支撑件在上盘变形时暴露 会员。