公开(公告)号：US12214504B2

公开(公告)日：2025-02-04

申请号：US17645009

申请日：2021-12-17

Applicant: DENSO CORPORATION

Inventor： Shota Ishikawa ,  Tomoaki Ozaki

IPC: B25J9/16

Abstract: A layout generation device includes: a waypoint registration unit, an arrangement generation unit, an arrangement evaluation unit, an arrangement extraction unit, a path determination unit, a path generation unit, an arrangement exclusion unit, and an arrangement evaluation update unit. The arrangement evaluation unit evaluates, as an evaluation value, an operation time of a robot without considering an obstacle for each of arrangements. The arrangement extraction unit extracts an arrangement having a best evaluation value from among the evaluated arrangements by the arrangement evaluation unit. The path determination unit determines whether or not an extracted arrangement extracted by the arrangement extraction unit needs to avoid an obstacle in terms of an operation of the robot via a waypoint.

公开(公告)号：US12049012B2

公开(公告)日：2024-07-30

申请号：US17363462

申请日：2021-06-30

Applicant: DENSO CORPORATION

Inventor： Shota Ishikawa

IPC: B25J9/16

CPC classification number: B25J9/1666 ,  B25J9/1653 ,  B25J9/1664 ,  G05B2219/40428 ,  G05B2219/40429

Abstract: A motion path generation device generates a motion path of a robot that has a plurality of joints and a plurality of shafts. Adjacent two of the plurality of shafts are connected by a corresponding one of the plurality of joints. The motion path generation device generates a via point candidate that is a candidate of a next via point to be connected to a parent via point. The motion path generation device adds the via point candidate as a new via point in response to determining that the via point candidate does not interfere with an obstacle.